| 10141445 |
Vertically aligned nanowire channels with source/drain interconnects for nanosheet transistors |
Marc A. Bergendahl, Kangguo Cheng, John R. Sporre, Sean Teehan |
2018-11-27 |
| 10121785 |
Pitch scalable active area patterning structure and process for multi-channel fin FET technologies |
Sivananda K. Kanakasabapathy, Fee Li Lie, Stuart A. Sieg |
2018-11-06 |
| 10109722 |
Etch-resistant spacer formation on gate structure |
Ruilong Xie, Zhenxing Bi, Pietro Montanini, Balasubramanian Pranatharthiharan, Oleg Gluschenkov +2 more |
2018-10-23 |
| 10083962 |
Fabrication of fin field effect transistors for complementary metal oxide semiconductor devices including separate n-type and p-type source/drains using a single spacer deposition |
Kangguo Cheng, Fee Li Lie, Sean Teehan |
2018-09-25 |
| 10074730 |
Forming stacked nanowire semiconductor device |
Marc A. Bergendahl, Kangguo Cheng, Fee Li Lie, Jeffrey C. Shearer, John R. Sporre +1 more |
2018-09-11 |
| 10043801 |
Air gap spacer for metal gates |
Marc A. Bergendahl, Kangguo Cheng, Fee Li Lie, John R. Sporre, Sean Teehan |
2018-08-07 |
| 10014391 |
Vertical transport field effect transistor with precise gate length definition |
Marc A. Bergendahl, Kangguo Cheng, Fee Li Lie, John R. Sporre, Sean Teehan |
2018-07-03 |
| 9997369 |
Margin for fin cut using self-aligned triple patterning |
Gauri Karve, Fee Li Lie, Stuart A. Sieg, John R. Sporre, Sean Teehan |
2018-06-12 |
| 9985138 |
Vertically aligned nanowire channels with source/drain interconnects for nanosheet transistors |
Marc A. Bergendahl, Kangguo Cheng, John R. Sporre, Sean Teehan |
2018-05-29 |
| 9917196 |
Semiconductor device and method of forming the semiconductor device |
Marc A. Bergendahl, Gauri Karve, Fee Li Lie, Robert R. Robison, John R. Sporre +1 more |
2018-03-13 |
| 9911831 |
Spacer formation on semiconductor device |
Thamarai S. Devarajan, Sanjay C. Mehta, Soon-Cheon Seo |
2018-03-06 |
| 9905643 |
Vertically aligned nanowire channels with source/drain interconnects for nanosheet transistors |
Marc A. Bergendahl, Kangguo Cheng, John R. Sporre, Sean Teehan |
2018-02-27 |
| 9893166 |
Dummy gate formation using spacer pull down hardmask |
Marc A. Bergendahl, Kangguo Cheng, Fee Li Lie, John R. Sporre, Sean Teehan |
2018-02-13 |
