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Stuart A. Sieg — 11 Patents in 2018

IBM: 11 patents #395 of 10,623Top 4%

Albany, NY: #6 of 148 inventorsTop 5%

New York: #229 of 11,825 inventorsTop 2%

Overall (2018): #5,067 of 503,207Top 2%

11 Patents 2018

Issued Patents 2018

Showing 1–11 of 11 patents

Patent #	Title	Co-Inventors	Date	Approx Value ⓘ
10121853	Structure and process to tuck fin tips self-aligned to gates	Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Fee Li Lie +2 more	2018-11-06	$3,429,000
10121852	Structure and process to tuck fin tips self-aligned to gates	Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Fee Li Lie +2 more	2018-11-06	$3,429,000
10121785	Pitch scalable active area patterning structure and process for multi-channel fin FET technologies	Sivananda K. Kanakasabapathy, Fee Li Lie, Eric R. Miller	2018-11-06	$3,429,000
10103022	Alternating hardmasks for tight-pitch line formation	John C. Arnold, Anuja E. DeSilva, Nelson Felix, Chi-Chun Liu, Yann Mignot	2018-10-16	$2,674,000
10043760	Registration mark formation during sidewall image transfer process	David J. Conklin, Allen H. Gabor, Sivananda K. Kanakasabapathy, Byeong Y. Kim, Fee Li Lie	2018-08-07	$1,950,000
10032680	Strained finFET device fabrication	Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Fee Li Lie	2018-07-24	$2,645,000
9997369	Margin for fin cut using self-aligned triple patterning	Gauri Karve, Fee Li Lie, Eric R. Miller, John R. Sporre, Sean Teehan	2018-06-12	$1,886,000
9917019	Strained FinFET device fabrication	Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Fee Li Lie	2018-03-13	$2,527,000
9882048	Gate cut on a vertical field effect transistor with a defined-width inorganic mask	Brent A. Anderson, Sivananda K. Kanakasabapathy, Jeffrey C. Shearer, John R. Sporre, Junli Wang	2018-01-30	$2,622,000
9876074	Structure and process to tuck fin tips self-aligned to gates	Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Fee Li Lie +2 more	2018-01-23	$4,886,000
9859224	Registration mark formation during sidewall image transfer process	David J. Conklin, Allen H. Gabor, Sivananda K. Kanakasabapathy, Byeong Y. Kim, Fee Li Lie	2018-01-02	$1,907,000