| 10141230 |
Method and structure to enable dual channel Fin critical dimension control |
Marc A. Bergendahl, Kangguo Cheng, John R. Sporre |
2018-11-27 |
| 10141445 |
Vertically aligned nanowire channels with source/drain interconnects for nanosheet transistors |
Marc A. Bergendahl, Kangguo Cheng, Eric R. Miller, John R. Sporre |
2018-11-27 |
| 10083962 |
Fabrication of fin field effect transistors for complementary metal oxide semiconductor devices including separate n-type and p-type source/drains using a single spacer deposition |
Kangguo Cheng, Fee Li Lie, Eric R. Miller |
2018-09-25 |
| 10074730 |
Forming stacked nanowire semiconductor device |
Marc A. Bergendahl, Kangguo Cheng, Fee Li Lie, Eric R. Miller, Jeffrey C. Shearer +1 more |
2018-09-11 |
| 10043801 |
Air gap spacer for metal gates |
Marc A. Bergendahl, Kangguo Cheng, Fee Li Lie, Eric R. Miller, John R. Sporre |
2018-08-07 |
| 10026615 |
Fin patterns with varying spacing without Fin cut |
Marc A. Bergendahl, Kangguo Cheng, John R. Sporre |
2018-07-17 |
| 10014391 |
Vertical transport field effect transistor with precise gate length definition |
Marc A. Bergendahl, Kangguo Cheng, Fee Li Lie, Eric R. Miller, John R. Sporre |
2018-07-03 |
| 9997369 |
Margin for fin cut using self-aligned triple patterning |
Gauri Karve, Fee Li Lie, Eric R. Miller, Stuart A. Sieg, John R. Sporre |
2018-06-12 |
| 9991117 |
Fin patterns with varying spacing without fin cut |
Marc A. Bergendahl, Kangguo Cheng, John R. Sporre |
2018-06-05 |
| 9985138 |
Vertically aligned nanowire channels with source/drain interconnects for nanosheet transistors |
Marc A. Bergendahl, Kangguo Cheng, Eric R. Miller, John R. Sporre |
2018-05-29 |
| 9984877 |
Fin patterns with varying spacing without fin cut |
Marc A. Bergendahl, Kangguo Cheng, John R. Sporre |
2018-05-29 |
| 9953915 |
Electrically conductive interconnect including via having increased contact surface area |
Hsueh-Chung Chen, James J. Demarest, Chih-Chao Yang |
2018-04-24 |
| 9917196 |
Semiconductor device and method of forming the semiconductor device |
Marc A. Bergendahl, Gauri Karve, Fee Li Lie, Eric R. Miller, Robert R. Robison +1 more |
2018-03-13 |
| 9905643 |
Vertically aligned nanowire channels with source/drain interconnects for nanosheet transistors |
Marc A. Bergendahl, Kangguo Cheng, Eric R. Miller, John R. Sporre |
2018-02-27 |
| 9893166 |
Dummy gate formation using spacer pull down hardmask |
Marc A. Bergendahl, Kangguo Cheng, Fee Li Lie, Eric R. Miller, John R. Sporre |
2018-02-13 |