| 10147725 |
Forming MOSFET structures with work function modification |
Ruqiang Bao, Gauri Karve, Robert R. Robison, Gen Tsutsui, Reinaldo Vega +1 more |
2018-12-04 |
| 10147839 |
Method of forming a metal silicide transparent conductive electrode |
Jeffrey P. Gambino, Daniel S. Vanslette |
2018-12-04 |
| 10121852 |
Structure and process to tuck fin tips self-aligned to gates |
Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Fee Li Lie +2 more |
2018-11-06 |
| 10121853 |
Structure and process to tuck fin tips self-aligned to gates |
Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Fee Li Lie +2 more |
2018-11-06 |
| 9922983 |
Threshold voltage modulation through channel length adjustment |
Ruqiang Bao, Dechao Guo, Huimei Zhou |
2018-03-20 |
| 9922984 |
Threshold voltage modulation through channel length adjustment |
Ruqiang Bao, Dechao Guo, Huimei Zhou |
2018-03-20 |
| 9881937 |
Preventing strained fin relaxation |
Kangguo Cheng, Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve +3 more |
2018-01-30 |
| 9876074 |
Structure and process to tuck fin tips self-aligned to gates |
Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Fee Li Lie +2 more |
2018-01-23 |
