| 10141308 |
Low resistance source/drain contacts for complementary metal oxide semiconductor (CMOS) devices |
Praneet Adusumilli, Oleg Gluschenkov, Zuoguang Liu, Rajasekhar Venigalla, Tenko Yamashita |
2018-11-27 |
| 10128239 |
Preserving channel strain in fin cuts |
Andrew M. Greene, Ravikumar Ramachandran, Rajasekhar Venigalla |
2018-11-13 |
| 10096713 |
FinFET with sigma recessed source/drain and un-doped buffer layer epitaxy for uniform junction formation |
Hemanth Jagannathan, Shogo Mochizuki, Gen Tsutsui, Chun-Chen Yeh |
2018-10-09 |
| 10068805 |
Self-aligned spacer for cut-last transistor fabrication |
Ruqiang Bao, Zuoguang Liu |
2018-09-04 |
| 10056378 |
Silicon nitride fill for PC gap regions to increase cell density |
Zuoguang Liu, Tenko Yamashita, Chun-Chen Yeh |
2018-08-21 |
| 10056382 |
Modulating transistor performance |
Juntao Li, Sanjay C. Mehta, Robert R. Robison, Huimei Zhou |
2018-08-21 |
| 10043891 |
Replacement metal gate scheme with self-alignment gate for vertical field effect transistors |
Raqiang Bao |
2018-08-07 |
| 10032679 |
Self-aligned doping in source/drain regions for low contact resistance |
Zuoguang Liu, Gen Tsutsui, Heng Wu |
2018-07-24 |
| 10020378 |
Self-aligned spacer for cut-last transistor fabrication |
Ruqiang Bao, Zuoguang Liu |
2018-07-10 |
| 9978750 |
Low resistance source/drain contacts for complementary metal oxide semiconductor (CMOS) devices |
Praneet Adusumilli, Oleg Gluschenkov, Zuoguang Liu, Rajasekhar Venigalla, Tenko Yamashita |
2018-05-22 |
| 9960254 |
Replacement metal gate scheme with self-alignment gate for vertical field effect transistors |
Raqiang Bao |
2018-05-01 |
| 9941282 |
Integrated metal gate CMOS devices |
Ruqiang Bao, Vijay Narayanan |
2018-04-10 |
| 9922984 |
Threshold voltage modulation through channel length adjustment |
Ruqiang Bao, Derrick Liu, Huimei Zhou |
2018-03-20 |
| 9922983 |
Threshold voltage modulation through channel length adjustment |
Ruqiang Bao, Derrick Liu, Huimei Zhou |
2018-03-20 |
| 9899264 |
Integrated metal gate CMOS devices |
Ruqiang Bao, Vijay Narayanan |
2018-02-20 |
| 9859286 |
Low-drive current FinFET structure for improving circuit density of ratioed logic in SRAM devices |
Veeraraghavan S. Basker, Zuoguang Liu, Tenko Yamashita, Chun-Chen Yeh |
2018-01-02 |
| 9859275 |
Silicon nitride fill for PC gap regions to increase cell density |
Zuoguang Liu, Tenko Yamashita, Chun-Chen Yeh |
2018-01-02 |
