| 10128239 |
Preserving channel strain in fin cuts |
Dechao Guo, Ravikumar Ramachandran, Rajasekhar Venigalla |
2018-11-13 |
| 10128238 |
Integrated circuit having oxidized gate cut region and method to fabricate same |
Kangguo Cheng, Peng Xu |
2018-11-13 |
| 10083961 |
Gate cut with integrated etch stop layer |
Marc A. Bergendahl, Rajasekhar Venigalla |
2018-09-25 |
| 10083861 |
HDP fill with reduced void formation and spacer damage |
Huiming Bu, Balasubramanian Pranatharthiharan, Ruilong Xie |
2018-09-25 |
| 10079287 |
Gate cut device fabrication with extended height gates |
Kangguo Cheng, John R. Sporre, Peng Xu |
2018-09-18 |
| 10002792 |
HDP fill with reduced void formation and spacer damage |
Huiming Bu, Balasubramanian Pranatharthiharan, Ruilong Xie |
2018-06-19 |
| 9935003 |
HDP fill with reduced void formation and spacer damage |
Huiming Bu, Balasubramanian Pranatharthiharan, Ruilong Xie |
2018-04-03 |
| 9929057 |
HDP fill with reduced void formation and spacer damage |
Huiming Bu, Balasubramanian Pranatharthiharan, Ruilong Xie |
2018-03-27 |
| 9923080 |
Gate height control and ILD protection |
John R. Sporre, Stan Tsai, Ruilong Xie |
2018-03-20 |
| 9923078 |
Trench silicide contacts with high selectivity process |
Balasubramanian Pranatharthiharan, Ruilong Xie |
2018-03-20 |
| 9911823 |
POC process flow for conformal recess fill |
Sanjay C. Mehta, Balasubramanian Pranatharthiharan, Ruilong Xie |
2018-03-06 |
