| 9825141 |
Three dimensional monolithic LDMOS transistor |
Qing Liu |
2017-11-21 |
| 9799524 |
Extended drain MOS device for FDSOI devices |
Akira Ito |
2017-10-24 |
| 9793378 |
Fin field effect transistor device with reduced overlap capacitance and enhanced mechanical stability |
Nicolas Loubet, Prasanna Khare, Qing Liu, Balasubramanian Pranatharthiharan |
2017-10-17 |
| 9768055 |
Isolation regions for SOI devices |
Qing Liu, Nicolas Loubet, Prasanna Khare, Maud Vinet, Bruce B. Doris |
2017-09-19 |
| 9741722 |
Dummy gate structure for electrical isolation of a fin DRAM |
John E. Barth, Jr., Kangguo Cheng, Bruce B. Doris, Herbert L. Ho, Ali Khakifirooz +4 more |
2017-08-22 |
| 9711503 |
Gate structures with protected end surfaces to eliminate or reduce unwanted EPI material growth |
Ruilong Xie, Juntao Li |
2017-07-18 |
| 9698148 |
Reduced footprint LDMOS structure for finFET technologies |
Akira Ito |
2017-07-04 |
| 9673087 |
Interconnect structures incorporating air-gap spacers |
Satya V. Nitta |
2017-06-06 |
| 9660030 |
Replacement gate electrode with a self-aligned dielectric spacer |
Marc A. Bergendahl, Steven J. Holmes, David V. Horak, Charles W. Koburger, III, Chih-Chao Yang |
2017-05-23 |
| 9633893 |
Method to protect against contact related shorts on UTBB |
Nicolas Loubet, Qing Liu |
2017-04-25 |
| 9627377 |
Self-aligned dielectric isolation for FinFET devices |
Marc A. Bergendahl, Kangguo Cheng, David V. Horak, Ali Khakifirooz, Theodorus E. Standaert +4 more |
2017-04-18 |
| 9620619 |
Borderless contact structure |
Veeraraghavan S. Basker, David V. Horak, Charles W. Koburger, III, Chih-Chao Yang |
2017-04-11 |
| 9614047 |
Gate contact with vertical isolation from source-drain |
David V. Horak, Balasubramanian Pranatharthiharan, Ruilong Xie |
2017-04-04 |
| 9613851 |
Method for manufacturing interconnect structures incorporating air gap spacers |
Satya V. Nitta |
2017-04-04 |
| 9595578 |
Undercut insulating regions for silicon-on-insulator device |
Kangguo Cheng, Bruce B. Doris, Balasubramanian Pranatharthiharan, Theodorus E. Standaert, Tenko Yamashita |
2017-03-14 |
| 9583613 |
Metal oxide semiconductor devices and fabrication methods |
Akira Ito |
2017-02-28 |
| 9576957 |
Self-aligned source/drain contacts |
Praneet Adusumilli, Emre Alptekin, Kangguo Cheng, Balasubramanian Pranatharthiharan |
2017-02-21 |
| 9564445 |
Dummy gate structure for electrical isolation of a fin DRAM |
John E. Barth, Jr., Kangguo Cheng, Bruce B. Doris, Herbert L. Ho, Ali Khakifirooz +4 more |
2017-02-07 |
| 9558991 |
Formation of isolation surrounding well implantation |
Kangguo Cheng, Theodorus E. Standaert, Tenko Yamashita |
2017-01-31 |
| 9548356 |
Shallow trench isolation structures |
Bruce B. Doris, Kangguo Cheng, Balasubramanian S. Haran, Ali Khakifirooz, Pranita Kerber +1 more |
2017-01-17 |
