Issued Patents 2017
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9779953 | Electromagnetic dipole for plasma density tuning in a substrate processing chamber | Joseph AuBuchon, Samer Banna | 2017-10-03 |
| 9752228 | Sputtering target for PVD chamber | Zhendong Liu, Rongjun Wang, Xianmin Tang, Srinivas Gandikota, Muhammad M. Rasheed | 2017-09-05 |
| 9646843 | Tunable magnetic field to improve uniformity | Andrew Nguyen, Haitao Wang, Maxim Mikhailovich Noginov, Reza Sadjadi, Chunlei Zhang +1 more | 2017-05-09 |
| 9620339 | Sputter source for semiconductor process chambers | Anantha K. Subramani, Prashanth Kothnur, Hanbing Wu | 2017-04-11 |
| 9613783 | Method and apparatus for controlling a magnetic field in a plasma chamber | Steven Lane, Kartik Ramaswamy, Travis Koh, Joseph AuBuchon, Yang Yang | 2017-04-04 |