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Apparatus and methods for reducing particles in semiconductor process chambers |
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Symmetrical inductively coupled plasma source with symmetrical flow chamber |
Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci, Douglas A. Buchberger, Jr. +5 more |
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Symmetric plasma process chamber |
James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Douglas A. Buchberger, Jr. +3 more |
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Tunable magnetic field to improve uniformity |
Tza-Jing Gung, Haitao Wang, Maxim Mikhailovich Noginov, Reza Sadjadi, Chunlei Zhang +1 more |
2017-05-09 |
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Non-intrusive measurement of a wafer DC self-bias in semiconductor processing equipment |
Sergey G. Belostotskiy, Chinh Dinh, Michael G. Chafin |
2017-03-21 |
