Issued Patents 2017
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9824862 | Symmetric VHF source for a plasma reactor | Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, James D. Carducci, Kenneth S. Collins +3 more | 2017-11-21 |
| 9799491 | Low electron temperature etch chamber with independent control over plasma density, radical composition and ion energy for atomic precision etching | Leonid Dorf, Kenneth S. Collins, Kartik Ramaswamy, James D. Carducci, Hamid Tavassoli +2 more | 2017-10-24 |
| 9761416 | Apparatus and methods for reducing particles in semiconductor process chambers | Andrew Nguyen, Bradley J. Howard, Ajit Balakrishna, Tom K. Cho, Kenneth S. Collins +3 more | 2017-09-12 |
| 9745663 | Symmetrical inductively coupled plasma source with symmetrical flow chamber | Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, James D. Carducci, Douglas A. Buchberger, Jr. +5 more | 2017-08-29 |
| 9741546 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2017-08-22 |
| 9721760 | Electron beam plasma source with reduced metal contamination | Leonid Dorf, Kenneth S. Collins, Kartik Ramaswamy, Nipun Misra, Gonzalo Monroy +2 more | 2017-08-01 |
| 9564297 | Electron beam plasma source with remote radical source | Ming-Feng Wu, Leonid Dorf, Ying Zhang, Kenneth S. Collins, Hamid Tavassoli +2 more | 2017-02-07 |