| 9824862 |
Symmetric VHF source for a plasma reactor |
Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, James D. Carducci, Kenneth S. Collins +3 more |
2017-11-21 |
| 9799491 |
Low electron temperature etch chamber with independent control over plasma density, radical composition and ion energy for atomic precision etching |
Kenneth S. Collins, Shahid Rauf, Kartik Ramaswamy, James D. Carducci, Hamid Tavassoli +2 more |
2017-10-24 |
| 9745663 |
Symmetrical inductively coupled plasma source with symmetrical flow chamber |
Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Shahid Rauf, James D. Carducci +5 more |
2017-08-29 |
| 9721760 |
Electron beam plasma source with reduced metal contamination |
Shahid Rauf, Kenneth S. Collins, Kartik Ramaswamy, Nipun Misra, Gonzalo Monroy +2 more |
2017-08-01 |
| 9564297 |
Electron beam plasma source with remote radical source |
Ming-Feng Wu, Shahid Rauf, Ying Zhang, Kenneth S. Collins, Hamid Tavassoli +2 more |
2017-02-07 |
