| 9824862 |
Symmetric VHF source for a plasma reactor |
Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, James D. Carducci, Shahid Rauf +3 more |
2017-11-21 |
| 9799491 |
Low electron temperature etch chamber with independent control over plasma density, radical composition and ion energy for atomic precision etching |
Leonid Dorf, Shahid Rauf, Kartik Ramaswamy, James D. Carducci, Hamid Tavassoli +2 more |
2017-10-24 |
| 9761416 |
Apparatus and methods for reducing particles in semiconductor process chambers |
Andrew Nguyen, Bradley J. Howard, Shahid Rauf, Ajit Balakrishna, Tom K. Cho +3 more |
2017-09-12 |
| 9745663 |
Symmetrical inductively coupled plasma source with symmetrical flow chamber |
Andrew Nguyen, Kartik Ramaswamy, Shahid Rauf, James D. Carducci, Douglas A. Buchberger, Jr. +5 more |
2017-08-29 |
| 9741546 |
Symmetric plasma process chamber |
James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more |
2017-08-22 |
| 9721760 |
Electron beam plasma source with reduced metal contamination |
Leonid Dorf, Shahid Rauf, Kartik Ramaswamy, Nipun Misra, Gonzalo Monroy +2 more |
2017-08-01 |
| 9721757 |
Elongated capacitively coupled plasma source for high temperature low pressure environments |
John C. Forster, Joseph Yudovsky, Garry K. Kwong, Tai T. Ngo, Kevin Griffin +1 more |
2017-08-01 |
| 9564297 |
Electron beam plasma source with remote radical source |
Ming-Feng Wu, Leonid Dorf, Shahid Rauf, Ying Zhang, Hamid Tavassoli +2 more |
2017-02-07 |
