| 9513553 |
Methods of providing patterned epitaxy templates for self-assemblable block copolymers for use in device lithography |
Sander Frederik Wuister, Vadim Yevgenyevich Banine, Jozef Maria Finders, Roelof Koole, Emiel Peeters |
2016-12-06 |
| 9503566 |
Method and apparatus for protecting moderator access for a conference call |
Joseph Patrick Thomas Goguen, Manish Sunder Punjabi, Carsten Bergmann, Christina Evelyn Lucey, Eric Reyes |
2016-11-22 |
| 9502221 |
Etch rate modeling and use thereof with multiple parameters for in-chamber and chamber-to-chamber matching |
John C. Valcore, Jr., Henry Povolny |
2016-11-22 |
| 9484243 |
Processing chamber with features from side wall |
Dean J. Larson, Jason Augustino, Andreas Fischer, Andre DESEPTE |
2016-11-01 |
| 9470969 |
Support, lithographic apparatus and device manufacturing method |
Theodorus Petrus Maria Cadee, Koen Jacobus Johannes Maria Zaal |
2016-10-18 |
| 9460894 |
Controlling ion energy within a plasma chamber |
Thorsten Lill, Alex Paterson, Gowri Kamarthy |
2016-10-04 |
| 9449797 |
Component of a plasma processing apparatus having a protective in situ formed layer on a plasma exposed surface |
Thorsten Lill |
2016-09-20 |
| 9412555 |
Lower electrode assembly of plasma processing chamber |
Jason Augustino, Quan Chau, Keith Gaff, Hanh Tuong Ha, Brett C. Richardson |
2016-08-09 |
| 9392643 |
Heating plate with planar heater zones for semiconductor processing |
Keith Gaff, Neil Benjamin, Keith Comendant |
2016-07-12 |
| 9390893 |
Sub-pulsing during a state |
John C. Valcore, Jr., Bradford J. Lyndaker |
2016-07-12 |
| 9391267 |
Method to etch non-volatile metal materials |
Meihua Shen, Samantha Tan, Jeffrey Marks, Thorsten Lill, Richard Janek +2 more |
2016-07-12 |
| 9368329 |
Methods and apparatus for synchronizing RF pulses in a plasma processing system |
John C. Valcore, Jr., Bradford J. Lyndaker |
2016-06-14 |
| 9349621 |
Vacuum seal arrangement useful in plasma processing chamber |
— |
2016-05-24 |
| 9330927 |
System, method and apparatus for generating pressure pulses in small volume confined process reactor |
Rajinder Dhindsa, Sang Ki Nam |
2016-05-03 |
| 9257638 |
Method to etch non-volatile metal materials |
Samantha Tan, Wenbing Yang, Meihua Shen, Richard Janek, Jeffrey Marks +1 more |
2016-02-09 |
| 9257295 |
Ion beam etching system |
Alex Paterson |
2016-02-09 |
| 9245761 |
Internal plasma grid for semiconductor fabrication |
Thorsten Lill, Vahid Vahedi, Alex Paterson, Monica Titus, Gowri Kamarthy |
2016-01-26 |
| 9229324 |
Methods of providing patterned templates for self-assemblable block copolymers for use in device lithography |
Vadim Yevgenyevich Banine, Jozef Maria Finders, Sander Frederik Wuister, Roelof Koole, Emiel Peeters |
2016-01-05 |
