| 9460894 |
Controlling ion energy within a plasma chamber |
Harmeet Singh, Alex Paterson, Gowri Kamarthy |
2016-10-04 |
| 9449797 |
Component of a plasma processing apparatus having a protective in situ formed layer on a plasma exposed surface |
Harmeet Singh |
2016-09-20 |
| 9431268 |
Isotropic atomic layer etch for silicon and germanium oxides |
Ivan L. Berry, III, Meihua Shen, Alan M. Schoepp, David Hemker |
2016-08-30 |
| 9406535 |
Ion injector and lens system for ion beam milling |
Ivan L. Berry, III |
2016-08-02 |
| 9391267 |
Method to etch non-volatile metal materials |
Meihua Shen, Harmeet Singh, Samantha Tan, Jeffrey Marks, Richard Janek +2 more |
2016-07-12 |
| 9320387 |
Sulfur doped carbon hard masks |
Sirish Reddy, Alice Hollister |
2016-04-26 |
| 9257638 |
Method to etch non-volatile metal materials |
Samantha Tan, Wenbing Yang, Meihua Shen, Richard Janek, Jeffrey Marks +1 more |
2016-02-09 |
| 9257293 |
Methods of forming silicon nitride spacers |
Nicolas Posseme, Olivier Joubert, Thibaut David |
2016-02-09 |
| 9245761 |
Internal plasma grid for semiconductor fabrication |
Harmeet Singh, Vahid Vahedi, Alex Paterson, Monica Titus, Gowri Kamarthy |
2016-01-26 |
