| 9520294 |
Atomic layer etch process using an electron beam |
Ankur Agarwal, Shahid Rauf |
2016-12-13 |
| 9508530 |
Plasma processing chamber with flexible symmetric RF return strap |
Mike Kellogg |
2016-11-29 |
| 9449796 |
Plasma processing system including a symmetrical remote plasma source for minimal ion energy |
Ankur Agarwal, Ajit Balakrishna |
2016-09-20 |
| 9418859 |
Plasma-enhanced etching in an augmented plasma processing system |
Eric A. Hudson, Andrew D. Bailey, III |
2016-08-16 |
| 9401264 |
Control of impedance of RF delivery path |
Alexei Marakhtanov, Ken Lucchesi, Luc Albarede |
2016-07-26 |
| 9396908 |
Systems and methods for controlling a plasma edge region |
Alexei Marakhtanov |
2016-07-19 |
| 9396910 |
Heat transfer plate for a showerhead electrode assembly of a capacitively coupled plasma processing apparatus |
Sang Ki Nam, Ryan Bise |
2016-07-19 |
| 9337000 |
Control of impedance of RF return path |
Alexei Marakhtanov, Ken Lucchesi, Luc Albarede |
2016-05-10 |
| 9330927 |
System, method and apparatus for generating pressure pulses in small volume confined process reactor |
Harmeet Singh, Sang Ki Nam |
2016-05-03 |
| 9287096 |
Methods and apparatus for a hybrid capacitively-coupled and an inductively-coupled plasma processing system |
Alexei Marakhtanov, Eric A. Hudson, Neil Benjamin |
2016-03-15 |
| 9267208 |
Methods for controlling plasma constituent flux and deposition during semiconductor fabrication and apparatus for implementing the same |
— |
2016-02-23 |
| 9263240 |
Dual zone temperature control of upper electrodes |
Alexei Marakhtanov, Ryan Bise, Lumin Li, Sang Ki Nam, Jim Rogers +5 more |
2016-02-16 |
| 9251999 |
Capacitively-coupled plasma processing system having a plasma processing chamber for processing a substrate |
Eric A. Hudson, Alexei Marakhtanov, Andreas Fischer |
2016-02-02 |
| 9245718 |
Showerhead electrode assembly in a capacitively coupled plasma processing apparatus |
Sang Ki Nam, Ryan Bise |
2016-01-26 |
| 9245720 |
Methods and apparatus for detecting azimuthal non-uniformity in a plasma processing system |
Alexei Marakhtanov |
2016-01-26 |
| 9230779 |
Methods and apparatus for correcting for non-uniformity in a plasma processing system |
Sang Ki Nam |
2016-01-05 |
