| 9520294 |
Atomic layer etch process using an electron beam |
Ankur Agarwal, Rajinder Dhindsa |
2016-12-13 |
| 9449794 |
Symmetrical inductively coupled plasma source with side RF feeds and spiral coil antenna |
Andrew Nguyen, Kartik Ramaswamy, Jason A. Kenney, Kenneth S. Collins, Yang Yang +2 more |
2016-09-20 |
| 9443700 |
Electron beam plasma source with segmented suppression electrode for uniform plasma generation |
Leonid Dorf, Kenneth S. Collins, Nipun Misra, Kartik Ramaswamy, James D. Carducci +1 more |
2016-09-13 |
| 9412563 |
Spatially discrete multi-loop RF-driven plasma source having plural independent zones |
Kartik Ramaswamy, Kenneth S. Collins, Steven Lane, Yang Yang, Lawrence Wong |
2016-08-09 |
| 9378941 |
Interface treatment of semiconductor surfaces with high density low energy plasma |
Aneesh Nainani, Bhushan Zope, Leonid Dorf, Adam Brand, Mathew Abraham +1 more |
2016-06-28 |
| 9362131 |
Fast atomic layer etch process using an electron beam |
Ankur Agarwal, Kartik Ramaswamy |
2016-06-07 |
| 9312106 |
Digital phase controller for two-phase operation of a plasma reactor |
Satoru Kobayashi, Kartik Ramaswamy, Kenneth S. Collins |
2016-04-12 |
| 9267742 |
Apparatus for controlling the temperature uniformity of a substrate |
Kallol Bera, Xiaoping Zhou, Douglas A. Buchberger, Jr., Andrew Nguyen, Hamid Tavassoli +1 more |
2016-02-23 |
| 9269546 |
Plasma reactor with electron beam plasma source having a uniform magnetic field |
Ming-Feng Wu, Ajit Balakrishna, Leonid Dorf, Kenneth S. Collins, Nipun Misra |
2016-02-23 |
