| 9418859 |
Plasma-enhanced etching in an augmented plasma processing system |
Andrew D. Bailey, III, Rajinder Dhindsa |
2016-08-16 |
| 9396961 |
Integrated etch/clean for dielectric etch applications |
Reza Arghavani, Shashank Deshmukh, Tom A. Kamp, Samantha Tan, Gerardo Delgadino |
2016-07-19 |
| 9384979 |
Apparatus for the deposition of a conformal film on a substrate and methods therefor |
Dae-Han Choi, Jisoo Kim, Sangheon Lee, Conan Chiang, S. M. Reza Sadjadi |
2016-07-05 |
| 9385021 |
Electronic knob for tuning radial etch non-uniformity at VHF frequencies |
Zhigang Chen |
2016-07-05 |
| 9384998 |
Technique to deposit sidewall passivation for high aspect ratio cylinder etch |
Dennis M. Hausmann, Joseph Scott Briggs |
2016-07-05 |
| 9378971 |
Technique to deposit sidewall passivation for high aspect ratio cylinder etch |
Joseph Scott Briggs |
2016-06-28 |
| 9287096 |
Methods and apparatus for a hybrid capacitively-coupled and an inductively-coupled plasma processing system |
Alexei Marakhtanov, Rajinder Dhindsa, Neil Benjamin |
2016-03-15 |
| 9263331 |
Method for forming self-aligned contacts/vias with high corner selectivity |
Ananth Indrakanti, Peng Wang |
2016-02-16 |
| 9263240 |
Dual zone temperature control of upper electrodes |
Alexei Marakhtanov, Rajinder Dhindsa, Ryan Bise, Lumin Li, Sang Ki Nam +5 more |
2016-02-16 |
| 9257300 |
Fluorocarbon based aspect-ratio independent etching |
Ranadeep Bhowmick |
2016-02-09 |
| 9251999 |
Capacitively-coupled plasma processing system having a plasma processing chamber for processing a substrate |
Rajinder Dhindsa, Alexei Marakhtanov, Andreas Fischer |
2016-02-02 |
