Issued Patents 2016
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9418859 | Plasma-enhanced etching in an augmented plasma processing system | Andrew D. Bailey, III, Rajinder Dhindsa | 2016-08-16 |
| 9396961 | Integrated etch/clean for dielectric etch applications | Reza Arghavani, Shashank Deshmukh, Tom A. Kamp, Samantha Tan, Gerardo Delgadino | 2016-07-19 |
| 9384979 | Apparatus for the deposition of a conformal film on a substrate and methods therefor | Dae-Han Choi, Jisoo Kim, Sangheon Lee, Conan Chiang, S. M. Reza Sadjadi | 2016-07-05 |
| 9385021 | Electronic knob for tuning radial etch non-uniformity at VHF frequencies | Zhigang Chen | 2016-07-05 |
| 9384998 | Technique to deposit sidewall passivation for high aspect ratio cylinder etch | Dennis M. Hausmann, Joseph Scott Briggs | 2016-07-05 |
| 9378971 | Technique to deposit sidewall passivation for high aspect ratio cylinder etch | Joseph Scott Briggs | 2016-06-28 |
| 9287096 | Methods and apparatus for a hybrid capacitively-coupled and an inductively-coupled plasma processing system | Alexei Marakhtanov, Rajinder Dhindsa, Neil Benjamin | 2016-03-15 |
| 9263331 | Method for forming self-aligned contacts/vias with high corner selectivity | Ananth Indrakanti, Peng Wang | 2016-02-16 |
| 9263240 | Dual zone temperature control of upper electrodes | Alexei Marakhtanov, Rajinder Dhindsa, Ryan Bise, Lumin Li, Sang Ki Nam +5 more | 2016-02-16 |
| 9257300 | Fluorocarbon based aspect-ratio independent etching | Ranadeep Bhowmick | 2016-02-09 |
| 9251999 | Capacitively-coupled plasma processing system having a plasma processing chamber for processing a substrate | Rajinder Dhindsa, Alexei Marakhtanov, Andreas Fischer | 2016-02-02 |