Issued Patents 2016
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9513553 | Methods of providing patterned epitaxy templates for self-assemblable block copolymers for use in device lithography | Vadim Yevgenyevich Banine, Jozef Maria Finders, Roelof Koole, Emiel Peeters, Harmeet Singh | 2016-12-06 |
| 9429837 | Aqueous curable imprintable medium and patterned layer forming method | Ties Van Bommel, Emile Johannes Karel Verstegen, Rifat Ata Mustafa Hikmet | 2016-08-30 |
| 9372399 | Imprint lithography method and imprintable medium | Martinus Bernardus Van Der Mark, Vadim Yevgenyevich Banine, Andre Bernardus Jeunink, Johan Frederik Dijksman, Emiel Peeters +5 more | 2016-06-21 |
| 9368366 | Methods for providing spaced lithography features on a substrate by self-assembly of block copolymers | Tamara Druzhinina, Mircea Dusa | 2016-06-14 |
| 9310700 | Lithography method and apparatus | Adrianus Hendrik Koevoets, Michael Jozef Mathijs Renkens | 2016-04-12 |
| 9285676 | Self-assemblable polymer and method for use in lithography | Aurelie Marie Andree Brizard, Wilhelmus Sebastianus Marcus Maria Ketelaars, Roelof Koole, Emiel Peeters, Christianus Martinus Van Heesch +2 more | 2016-03-15 |
| 9278466 | Imprint lithography method and apparatus | Vadim Yevgenyevich Banine, Johan Frederik Dijksman, Yvonne Wendela Kruijt-Stegeman, Jeroen Herman Lammers, Roelof Koole | 2016-03-08 |
| 9261784 | Lithographic patterning process and resists to use therein | Vladimir Mihailovitch Krivtsun, Andrei Mikhailovich Yakunin | 2016-02-16 |
| 9250528 | Methods and compositions for providing spaced lithography features on a substrate by self-assembly of block copolymers | Emiel Peeters | 2016-02-02 |
| 9235125 | Methods of providing patterned chemical epitaxy templates for self-assemblable block copolymers for use in device lithography | Emiel Peeters, Wilhelmus Sebastianus Marcus Maria Ketelaars, Roelof Koole, Christianus Martinus Van Heesch, Aurelie Marie Andree Brizard +3 more | 2016-01-12 |
| 9229324 | Methods of providing patterned templates for self-assemblable block copolymers for use in device lithography | Harmeet Singh, Vadim Yevgenyevich Banine, Jozef Maria Finders, Roelof Koole, Emiel Peeters | 2016-01-05 |