Issued Patents 2016
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9513553 | Methods of providing patterned epitaxy templates for self-assemblable block copolymers for use in device lithography | Sander Frederik Wuister, Vadim Yevgenyevich Banine, Jozef Maria Finders, Roelof Koole, Harmeet Singh | 2016-12-06 |
| 9470609 | Preparation of thin layers of a fluid containing cells for analysis | Reinhold Wimberger-Friedl, Nicolaas Petrus Willard, Ivo Godfried Jozef Camps, Markus Laubscher, Oana Mihaela Piciu | 2016-10-18 |
| 9372399 | Imprint lithography method and imprintable medium | Martinus Bernardus Van Der Mark, Vadim Yevgenyevich Banine, Andre Bernardus Jeunink, Johan Frederik Dijksman, Sander Frederik Wuister +5 more | 2016-06-21 |
| 9285676 | Self-assemblable polymer and method for use in lithography | Aurelie Marie Andree Brizard, Wilhelmus Sebastianus Marcus Maria Ketelaars, Sander Frederik Wuister, Roelof Koole, Christianus Martinus Van Heesch +2 more | 2016-03-15 |
| 9267109 | Patterned cell sheets and a method for production of the same | Roel Penterman, Ralph Kurt, Dirk Jan Broer | 2016-02-23 |
| 9250528 | Methods and compositions for providing spaced lithography features on a substrate by self-assembly of block copolymers | Sander Frederik Wuister | 2016-02-02 |
| 9235125 | Methods of providing patterned chemical epitaxy templates for self-assemblable block copolymers for use in device lithography | Wilhelmus Sebastianus Marcus Maria Ketelaars, Sander Frederik Wuister, Roelof Koole, Christianus Martinus Van Heesch, Aurelie Marie Andree Brizard +3 more | 2016-01-12 |
| 9229324 | Methods of providing patterned templates for self-assemblable block copolymers for use in device lithography | Harmeet Singh, Vadim Yevgenyevich Banine, Jozef Maria Finders, Sander Frederik Wuister, Roelof Koole | 2016-01-05 |