Issued Patents 2016
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9508529 | System, method and apparatus for RF power compensation in a plasma processing system | John C. Valcore, Jr. | 2016-11-29 |
| 9502221 | Etch rate modeling and use thereof with multiple parameters for in-chamber and chamber-to-chamber matching | John C. Valcore, Jr., Harmeet Singh | 2016-11-22 |
| 9455126 | Arrangement for plasma processing system control based on RF voltage | John C. Valcore, Jr. | 2016-09-27 |