Issued Patents 2011
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8083853 | Plasma uniformity control by gas diffuser hole design | Soo Young Choi, Qunhua Wang, Li Hou, Ki Woon Kim, Shinichi Kurita +4 more | 2011-12-27 |
| 8075952 | Power loading substrates to reduce particle contamination | Dong-Kil Yim, Soo Young Choi, Han Byoul Kim, Jin Man Ha, Beom Soo Park | 2011-12-13 |
| 8075690 | Diffuser gravity support | Ernst Keller, Robin L. Tiner, Jiri Kucera, Soo Young Choi, Beom Soo Park +1 more | 2011-12-13 |
| 8074599 | Plasma uniformity control by gas diffuser curvature | Soo Young Choi, Beom Soo Park, Robin L. Tiner | 2011-12-13 |
| 8004293 | Plasma processing chamber with ground member integrity indicator and method for using the same | Carl A. Sorensen | 2011-08-23 |
| 7992956 | Systems and methods for calibrating inkjet print head nozzles using light transmittance measured through deposited ink | Quanyuan Shang | 2011-08-09 |
| 7988129 | Floating slit valve for transfer chamber interface | Shinichi Kurita, Takayuki Matsumoto | 2011-08-02 |
| 7973546 | In-line electron beam test system | Fayez E. Abboud, Sriram Krishnaswami, Benjamin M. Johnston, Hung T. Nguyen, Matthias Brunner +3 more | 2011-07-05 |
| 7959987 | Fuel cell conditioning layer | Tae Kyung Won, Robert Z. Bachrach, Wendell T. Blonigan | 2011-06-14 |
| 7923354 | Methods for depositing a microcrystalline silicon film for a photovoltaic device | Soo Young Choi, Takako Takehara, Yong Kee Chae | 2011-04-12 |
| 7902991 | Frequency monitoring to detect plasma process abnormality | Beom Soo Park, Soo Young Choi, Hong Soon Kim, James Hoffman | 2011-03-08 |
| 7884035 | Method of controlling film uniformity and composition of a PECVD-deposited A-SiNx : H gate dielectric film deposited over a large substrate surface | Beom Soo Park, Soo Young Choi, Tae Kyung Won | 2011-02-08 |
| 7879210 | Partially suspended rolling magnetron | Makoto Inagawa, Akihiro Hosokawa | 2011-02-01 |
| 7879409 | Repeatability of CVD film deposition during sequential processing of substrates in a deposition chamber | Gaku Furuta, Tae Kyung Won | 2011-02-01 |