SJ

Syun-Ming Jang

TSMC: 18 patents #3 of 851Top 1%
Overall (2005): #188 of 245,428Top 1%
18
Patents 2005

Issued Patents 2005

Showing 1–18 of 18 patents

Patent #TitleCo-InventorsDate
6974730 Method for fabricating a recessed channel field effect transistor (FET) device Carlos H. Diaz, Yi-Ming Sheu, Hun-Jan Tao, Fu-Liang Yang 2005-12-13
RE38914 Dual damascene patterned conductor layer formation method without etch stop layer Chen-Hua Yu 2005-12-06
6972253 Method for forming dielectric barrier layer in damascene structure Ai-Sen Liu 2005-12-06
6962869 SiOCH low k surface protection layer formation by CxHy gas plasma treatment Tien-I Bao, Hsin-Hsien Lu, Lih-Ping Li, Chung-Chi Ko, Aaron Song 2005-11-08
6958291 Interconnect with composite barrier layers and method for fabricating the same Chen-Hua Yu, Horng-Huei Tseng, Chenming Hu 2005-10-25
6946397 Chemical mechanical polishing process with reduced defects in a copper process William Weilun Hong, Chia-Che CHUNG, Chi-Wei Chung, Wen-Chih Chiou, Ying-Ho Chen 2005-09-20
6930040 Method of forming a contact on a silicon-on-insulator wafer Chuan-Ping Hou, Ying-Ho Chen, Tung-Ching Tseng 2005-08-16
6924238 Edge peeling improvement of low-k dielectric materials stack by adjusting EBR resistance Tzu-Jen Chou, Ying-Ho Chen, Shen-Nan Lee 2005-08-02
6924242 SiOC properties and its uniformity in bulk for damascene applications Chung-Chi Ko, Tien-I Bao, Lih-Ping Li, Al-Sen Liu 2005-08-02
6919276 Method to reduce dishing and erosion in a CMP process Shen-Nan Lee, Ying-Ho Chen, Tzu-Jen Chou, Jin-Yiing Song 2005-07-19
6908773 ATR-FTIR metal surface cleanliness monitoring Lain-Jong Li, Chung-Chi Ko 2005-06-21
6895360 Method to measure oxide thickness by FTIR to improve an in-line CMP endpoint determination Ai-Sen Liu 2005-05-17
6884659 Thin interface layer to improve copper etch stop Bi-Trong Chen, Lain-Jong Li, Shu E Ku, Tien-I Bao, Lih-Ping Li 2005-04-26
6884149 Method and system for in-situ monitoring of mixing ratio of high selectivity slurry Shang-Ting Tsai, Ping Chuang, Henry Lo, Chao-Jung Chang, Ping-Hsu Chen +3 more 2005-04-26
6878621 Method of fabricating barrierless and embedded copper damascene interconnects Zhen-Cheng Wu, Lain-Jong Li, Yung-Chen Lu 2005-04-12
6869858 Shallow trench isolation planarized by wet etchback and chemical mechanical polishing Ying-Ho Chen 2005-03-22
6867135 Via bottom copper/barrier interface improvement to resolve via electromigration and stress migration Tien-I Bao 2005-03-15
6849549 Method for forming dummy structures for improved CMP and reduced capacitance Wen-Chih Chiou 2005-02-01