Issued Patents 2005
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6962524 | Conductive polishing article for electrochemical mechanical polishing | Paul D. Butterfield, Liang-Yuh Chen, Yonqi Hu, Antoine P. Manens, Rashid Mavliev +5 more | 2005-11-08 |
| 6946884 | Fractional-N baseband frequency synthesizer in bluetooth applications | William Eric Holland, Wenzhe Luo, Zhigang Ma, Dale H. Nelson, Harold Simmonds +1 more | 2005-09-20 |
| 6899804 | Electrolyte composition and treatment for electrolytic chemical mechanical polishing | Alain Duboust, Feng Q. Liu, Yuchun Wang, Yan Wang, Siew Neo +1 more | 2005-05-31 |
| 6863797 | Electrolyte with good planarization capability, high removal rate and smooth surface finish for electrochemically controlled copper CMP | Feng Q. Liu, Siew Neo, Stan Tsai, Liang-Yuh Chen | 2005-03-08 |
| 6858540 | Selective removal of tantalum-containing barrier layer during metal CMP | Stan Tsai, Shijian Li, Fred C. Redeker | 2005-02-22 |