Issued Patents 2004
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6828554 | Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same | Takashi Hiroi, Maki Tanaka, Masahiro Watanabe, Asahiro Kuni, Yukio Matsuyama +3 more | 2004-12-07 |
| 6797954 | Patterned wafer inspection method and apparatus therefor | Hiroyuki Shinada, Yusuke Yajima, Hisaya Murakoshi, Masaki Hasegawa, Atsuko Takafuji +4 more | 2004-09-28 |
| 6777677 | Method of inspecting pattern and inspecting instrument | Hidetoshi Nishiyama, Shigeaki Hijikata, Kenji Watanabe, Koji Abe | 2004-08-17 |
| 6759655 | Inspection method, apparatus and system for circuit pattern | Yasuhiko Nara, Kazuhisa Machida, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi +1 more | 2004-07-06 |
| 6757621 | Process management system | Fumio Mizuno, Seiji Isogai, Kenji Watanabe, Yasuhiro Yoshitake, Terushige Asakawa +12 more | 2004-06-29 |
| 6753524 | Inspection system and inspection process for wafer with circuit using charged-particle beam | Miyako Matsui | 2004-06-22 |
| 6717142 | Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same | Takashi Hiroi, Maki Tanaka, Masahiro Watanabe, Asahiro Kuni, Yukio Matsuyama +3 more | 2004-04-06 |
| 6703850 | Method of inspecting circuit pattern and inspecting instrument | Hiroyuki Shinada, Kenji Watanabe, Keiichi Saiki, Aritoshi Sugimoto, Hiroshi Morioka +2 more | 2004-03-09 |
| 6700122 | Wafer inspection system and wafer inspection process using charged particle beam | Miyako Matsui, Atsuko Takafuji | 2004-03-02 |