Issued Patents 2004
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6800859 | Method and equipment for detecting pattern defect | Hiroaki Shishido, Toshihiko Nakata, Shunji Maeda, Minoru Yoshida, Sachio Uto | 2004-10-05 |
| 6801827 | Overlay inspection apparatus for semiconductor substrate and method thereof | Shunichi Matsumoto, Toshiharu Miwa | 2004-10-05 |
| 6757621 | Process management system | Fumio Mizuno, Seiji Isogai, Kenji Watanabe, Terushige Asakawa, Yuichi Ohyama +12 more | 2004-06-29 |
| 6721940 | Exposure processing method and exposure system for the same | Toshiharu Miwa, Tetsuya Yamazaki | 2004-04-13 |
| 6720117 | Exposure mask with appended mask error data | Shunichi Matsumoto, Takeshi Kato, Norio Hasegawa | 2004-04-13 |
| 6697698 | Overlay inspection apparatus for semiconductor substrate and method thereof | Shunichi Matsumoto, Toshiharu Miwa | 2004-02-24 |
| 6686107 | Method for producing a semiconductor device | Shunichi Matsumoto, Takeshi Kato, Norio Hasegawa | 2004-02-03 |