Issued Patents 2004
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6824958 | Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit device | Katsuya Hayano | 2004-11-30 |
| 6800421 | Method of fabrication of semiconductor integrated circuit device | Toshihiko Tanaka | 2004-10-05 |
| 6794207 | Method of manufacturing integrated circuit | Joji Okada, Toshihiko Tanaka, Kazutaka Mori, Ko Miyazaki | 2004-09-21 |
| 6750496 | Manufacturing method of semiconductor integrated circuit device, and semiconductor integrated circuit device | Katsuya Hayano, Akira Imai | 2004-06-15 |
| 6750000 | Electron device manufacturing method, a pattern forming method, and a photomask used for those methods | Toshihiko Tanaka, Hiroshi Shiraishi, Hidetoshi Satoh | 2004-06-15 |
| 6733953 | Photomask and pattern forming method employing the same | Fumio Murai, Katsuya Hayano | 2004-05-11 |
| 6720117 | Exposure mask with appended mask error data | Shunichi Matsumoto, Yasuhiro Yoshitake, Takeshi Kato | 2004-04-13 |
| 6713231 | Method of manufacturing semiconductor integrated circuit devices | Akira Imai, Katsuya Hayano | 2004-03-30 |
| 6709772 | Organic electrically conductive compound and an organic electroluminescent device including the compound | Akira Shiga, Youichi Itagaki | 2004-03-23 |
| 6706452 | Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit device | Katsuya Hayano | 2004-03-16 |
| 6706424 | Organic electrically conductive compound and an organic electroluminescent device including the compound | Akira Shiga, Youichi Itagaki | 2004-03-16 |
| 6686108 | Fabrication method of semiconductor integrated circuit device | Osamu Inoue, Shuji Ikeda | 2004-02-03 |
| 6686107 | Method for producing a semiconductor device | Shunichi Matsumoto, Yasuhiro Yoshitake, Takeshi Kato | 2004-02-03 |
| 6686099 | Method of manufacturing a photomask | Toshihiko Tanaka, Tsuneo Terasawa | 2004-02-03 |
| 6677107 | Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used therefor | Tsuneo Terasawa, Toshihiko Tanaka | 2004-01-13 |