Issued Patents 2004
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6828554 | Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same | Takashi Hiroi, Maki Tanaka, Masahiro Watanabe, Asahiro Kuni, Yukio Matsuyama +3 more | 2004-12-07 |
| 6825480 | Charged particle beam apparatus and automatic astigmatism adjustment method | Masahiro Watanabe, Atsuko Takafuji, Masami Iizuka, Yasuhiro Gunji, Kouichi Hayakawa +1 more | 2004-11-30 |
| 6797954 | Patterned wafer inspection method and apparatus therefor | Yusuke Yajima, Hisaya Murakoshi, Masaki Hasegawa, Mari Nozoe, Atsuko Takafuji +4 more | 2004-09-28 |
| 6768113 | WORKPIECE HOLDER, SEMICONDUCTOR FABRICATING APPARATUS, SEMICONDUCTOR INSPECTING APPARATUS, CIRCUIT PATTERN INSPECTING APPARATUS, CHARGED PARTICLE BEAM APPLICATION APPARATUS, CALIBRATING SUBSTRATE, WORKPIECE HOLDING METHOD, CIRCUIT PATTERN INSPECTING METHOD, AND CHARGED PARTICLE BEAM APPLICATION METHOD | Hiroyuki Suzuki, Atsuko Takafuji, Yasutsugu Usami, Shuji Sugiyama | 2004-07-27 |
| 6753518 | Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus | Masahiro Watanabe, Takashi Hiroi, Maki Tanaka, Yasutsugu Usami | 2004-06-22 |
| 6744057 | Convergent charged particle beam apparatus and inspection method using same | Maki Tanaka, Masahiro Watanabe, Takashi Hiroi, Taku Ninomiya | 2004-06-01 |
| 6717142 | Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same | Takashi Hiroi, Maki Tanaka, Masahiro Watanabe, Asahiro Kuni, Yukio Matsuyama +3 more | 2004-04-06 |
| 6703850 | Method of inspecting circuit pattern and inspecting instrument | Mari Nozoe, Kenji Watanabe, Keiichi Saiki, Aritoshi Sugimoto, Hiroshi Morioka +2 more | 2004-03-09 |