SD

Srikanteswara Dakshina-Murthy

AM AMD: 14 patents #21 of 1,035Top 3%
🗺 Texas: #28 of 8,731 inventorsTop 1%
Overall (2004): #569 of 270,089Top 1%
14
Patents 2004

Issued Patents 2004

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDate
6835618 Epitaxially grown fin for FinFET Chih-Yuh Yang, Bin Yu 2004-12-28
6833588 Semiconductor device having a U-shaped gate structure Bin Yu, Shibly S. Ahmed, Judy Xilin An, Zoran Krivokapic, Haihong Wang 2004-12-21
6825114 Selective stress-inducing implant and resulting pattern distortion in amorphous carbon patterning Philip A. Fisher, Christopher F. Lyons 2004-11-30
6815268 Method for forming a gate in a FinFET device Bin Yu, Judy Xilin An 2004-11-09
6803631 Strained channel finfet Judy Xilin An, Zoran Krivokapic, Haihong Wang, Bin Yu 2004-10-12
6797552 Method for defect reduction and enhanced control over critical dimensions and profiles in semiconductor devices Mark S. Chang, Douglas J. Bonser, Marina V. Plat, Chih-Yuh Yang, Scott A. Bell 2004-09-28
6787854 Method for forming a fin in a finFET device Chih-Yuh Yang, Shibly S. Ahmed, Cyrus E. Tabery, Haihong Wang, Bin Yu 2004-09-07
6787476 Etch stop layer for etching FinFET gate over a large topography Cyrus E. Tabery, Chih-Yuh Yang, Bin Yu 2004-09-07
6773998 Modified film stack and patterning strategy for stress compensation and prevention of pattern distortion in amorphous carbon gate patterning Philip A. Fisher, Marina V. Plat, Chih-Yuh Yang, Christopher F. Lyons, Scott A. Bell +2 more 2004-08-10
6764949 Method for reducing pattern deformation and photoresist poisoning in semiconductor device fabrication Douglas J. Bonser, Marina V. Plat, Chih-Yuh Yang, Scott A. Bell, Darin A. Chan +6 more 2004-07-20
6762483 Narrow fin FinFET Zoran Krivokapic, Judy Xilin An, Haihong Wang, Bin Yu 2004-07-13
6750127 Method for fabricating a semiconductor device using amorphous carbon having improved etch resistance Mark S. Chang, Darin A. Chan, Chih-Yuh Yang, Lu You, Scott A. Bell +1 more 2004-06-15
6696334 Method for formation of a differential offset spacer Kay Hellig, Christoph Schwan 2004-02-24
6673635 Method for alignment mark formation for a shallow trench isolation process Kay Hellig, Douglas J. Bonser 2004-01-06