Issued Patents 2004
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6833588 | Semiconductor device having a U-shaped gate structure | Bin Yu, Judy Xilin An, Srikanteswara Dakshina-Murthy, Zoran Krivokapic, Haihong Wang | 2004-12-21 |
| 6812119 | Narrow fins by oxidation in double-gate finfet | Ming-Ren Lin, Haihong Wang, Bin Yu | 2004-11-02 |
| 6812076 | Dual silicon layer for chemical mechanical polishing planarization | Krishnashree Achuthan, Haihong Wang, Bin Yu | 2004-11-02 |
| 6787854 | Method for forming a fin in a finFET device | Chih-Yuh Yang, Srikanteswara Dakshina-Murthy, Cyrus E. Tabery, Haihong Wang, Bin Yu | 2004-09-07 |
| 6787406 | Systems and methods for forming dense n-channel and p-channel fins using shadow implanting | Wiley Eugene Hill, Haihong Wang, Bin Yu | 2004-09-07 |
| 6787439 | Method using planarizing gate material to improve gate critical dimension in semiconductor devices | Cyrus E. Tabery, Haihong Wang, Bin Yu | 2004-09-07 |
| 6756643 | Dual silicon layer for chemical mechanical polishing planarization | Krishnashree Achuthan, Haihong Wang, Bin Yu | 2004-06-29 |
| 6686231 | Damascene gate process with sacrificial oxide in semiconductor devices | Haihong Wang, Bin Yu | 2004-02-03 |