Issued Patents 2004
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6828259 | Enhanced transistor gate using E-beam radiation | Philip A. Fisher, Chih-Yuh Yang, Russell R.A. Callahan, Ashok M. Khathuria | 2004-12-07 |
| 6818141 | Application of the CVD bilayer ARC as a hard mask for definition of the subresolution trench features between polysilicon wordlines | Kouros Ghandehari | 2004-11-16 |
| 6803178 | Two mask photoresist exposure pattern for dense and isolated regions | Ramkumar Subramanian, Scott A. Bell, Todd P. Lukanc, Uzodinma Okoroanyanwu, Hung-Eli Kim | 2004-10-12 |
| 6797552 | Method for defect reduction and enhanced control over critical dimensions and profiles in semiconductor devices | Mark S. Chang, Douglas J. Bonser, Chih-Yuh Yang, Scott A. Bell, Srikanteswara Dakshina-Murthy | 2004-09-28 |
| 6773998 | Modified film stack and patterning strategy for stress compensation and prevention of pattern distortion in amorphous carbon gate patterning | Philip A. Fisher, Chih-Yuh Yang, Christopher F. Lyons, Scott A. Bell, Douglas J. Bonser +2 more | 2004-08-10 |
| 6764949 | Method for reducing pattern deformation and photoresist poisoning in semiconductor device fabrication | Douglas J. Bonser, Chih-Yuh Yang, Scott A. Bell, Darin A. Chan, Philip A. Fisher +6 more | 2004-07-20 |
| 6764947 | Method for reducing gate line deformation and reducing gate line widths in semiconductor devices | Darin A. Chan, Douglas J. Bonser, Marilyn I. Wright, Chih-Yuh Yang, Lu You +2 more | 2004-07-20 |
| 6753266 | Method of enhancing gate patterning properties with reflective hard mask | Todd P. Lukanc, Scott A. Bell, Christopher F. Lyons, Ramkumar Subramanian | 2004-06-22 |
| 6737222 | Dual damascene process utilizing a bi-layer imaging layer | Ramkumar Subramanian, Christopher F. Lyons, Scott A. Bell | 2004-05-18 |
| 6689541 | Process for forming a photoresist mask | Scott A. Bell, Todd P. Lukanc, Christopher F. Lyons, Ramkumar Subramanian | 2004-02-10 |
| 6689682 | Multilayer anti-reflective coating for semiconductor lithography | Robert B. Ogle, Tuan Pham | 2004-02-10 |