Issued Patents 2004
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6825115 | Post silicide laser thermal annealing to avoid dopant deactivation | Qi Xiang, Eric N. Paton, Cyrus E. Tabery, Bin Yu | 2004-11-30 |
| 6812106 | Reduced dopant deactivation of source/drain extensions using laser thermal annealing | Qi Xiang, Eric N. Paton, Cyrus E. Tabery, Bin Yu | 2004-11-02 |
| 6803272 | Use of high-K dielectric material in modified ONO structure for semiconductor devices | Arvind Halliyal, Mark T. Ramsbey, Kuo-Tung Chang, Nicholas H. Tripsas | 2004-10-12 |
| 6798002 | Dual-purpose anti-reflective coating and spacer for flash memory and other dual gate technologies and method of forming | Tuan Pham, Mark T. Ramsbey | 2004-09-28 |
| 6780789 | Laser thermal oxidation to form ultra-thin gate oxide | Bin Yu, Eric N. Paton, Cyrus E. Tabery, Qi Xiang | 2004-08-24 |
| 6746944 | Low nisi/si interface contact resistance with preamorphizing and laser thermal annealing | Qi Xiang, Eric N. Paton, Cyrus E. Tabery, Bin Yu | 2004-06-08 |
| 6743689 | Method of fabrication SOI devices with accurately defined monocrystalline source/drain extensions | Eric N. Paton, Cyrus E. Tabery, Qi Xiang, Bin Yu | 2004-06-01 |
| 6716702 | Method of forming flash memory having pre-interpoly dielectric treatment layer | Arvind Halliyal | 2004-04-06 |
| 6709927 | Process for treating ONO dielectric film of a floating gate memory cell | Arvind Halliyal | 2004-03-23 |
| 6689682 | Multilayer anti-reflective coating for semiconductor lithography | Tuan Pham, Marina V. Plat | 2004-02-10 |
| 6680250 | Formation of deep amorphous region to separate junction from end-of-range defects | Eric N. Paton, Cyrus E. Tabery, Qi Xiang, Bin Yu | 2004-01-20 |
| 6674138 | Use of high-k dielectric materials in modified ONO structure for semiconductor devices | Arvind Halliyal, Mark T. Ramsbey, Kuo-Tung Chang, Nicholas H. Tripsas | 2004-01-06 |