Issued Patents 2004
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6818358 | Method of extending the areas of clear field phase shift generation | Christopher A. Spence | 2004-11-16 |
| 6803178 | Two mask photoresist exposure pattern for dense and isolated regions | Ramkumar Subramanian, Scott A. Bell, Marina V. Plat, Uzodinma Okoroanyanwu, Hung-Eli Kim | 2004-10-12 |
| 6797438 | Method and enhancing clear field phase shift masks with border around edges of phase regions | Christopher A. Spence | 2004-09-28 |
| 6768204 | Self-aligned conductive plugs in a semiconductor device | Fei Wang, Darrell M. Erb | 2004-07-27 |
| 6753266 | Method of enhancing gate patterning properties with reflective hard mask | Scott A. Bell, Christopher F. Lyons, Marina V. Plat, Ramkumar Subramanian | 2004-06-22 |
| 6749971 | Method of enhancing clear field phase shift masks with chrome border around phase 180 regions | Christopher A. Spence | 2004-06-15 |
| 6749970 | Method of enhancing clear field phase shift masks with border regions around phase 0 and phase 180 regions | Christopher A. Spence | 2004-06-15 |
| 6689541 | Process for forming a photoresist mask | Scott A. Bell, Christopher F. Lyons, Marina V. Plat, Ramkumar Subramanian | 2004-02-10 |
| 6675369 | Method of enhancing clear field phase shift masks by adding parallel line to phase 0 region | Christopher A. Spence | 2004-01-06 |