Issued Patents 2004
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6830850 | Interferometric lithography using reflected light from applied layers | Zoran Krivokapic | 2004-12-14 |
| 6829380 | Optimization of OPC design factors utilizing an advanced algorithm on a low voltage CD-SEM system | Bryan K. Choo, Sanjay K. Yedur | 2004-12-07 |
| 6828162 | System and method for active control of BPSG deposition | Arvind Halliyal, Michael K. Templeton, Ramkumar Subramanian | 2004-12-07 |
| 6818360 | Quartz mask crack monitor system for reticle by acoustic and/or laser scatterometry | Khoi A. Phan, Bharath Rangarajan | 2004-11-16 |
| 6815229 | In situ monitoring of sheet resistivity of silicides during rapid thermal annealing using electrical methods | Arvind Halliyal, Ramkumar Subramanian | 2004-11-09 |
| 6813574 | Topographically aligned layers and method for adjusting the relative alignment of layers and apparatus therefor | Sanjay K. Yedur, Bharath Rangarajan, Ramkumar Subramanian | 2004-11-02 |
| 6808591 | Model based metal overetch control | Khoi A. Phan, Bharath Rangarajan, Christopher F. Lyons, Steven C. Avanzino, Ramkumar Subramanian +1 more | 2004-10-26 |
| 6809793 | System and method to monitor reticle heating | Khoi A. Phan, Ramkumar Subramanian, Bharath Rangarajan | 2004-10-26 |
| 6793765 | Situ monitoring of microloading using scatterometry with variable pitch gratings | Catherine B. Labelle, Bharath Rangarajan | 2004-09-21 |
| 6784446 | Reticle defect printability verification by resist latent image comparison | Khoi A. Phan, Bharath Rangarajan | 2004-08-31 |
| 6778268 | System and method for process monitoring of polysilicon etch | Bharath Rangarajan, Michael K. Templeton | 2004-08-17 |
| 6774989 | Interlayer dielectric void detection | Bharath Rangarajan, Michael K. Templeton, Arvind Halliyal | 2004-08-10 |
| 6774365 | SEM inspection and analysis of patterned photoresist features | Uzodinma Okoroanyanwu, Alden Acheta | 2004-08-10 |
| 6771374 | Scatterometry based measurements of a rotating substrate | Bharath Rangarajan, Michael K. Templeton, Ramkumar Subramanian | 2004-08-03 |
| 6771356 | Scatterometry of grating structures to monitor wafer stress | Christopher F. Lyons, Steven C. Avanzino, Khoi A. Phan, Bharath Rangarajan, Ramkumar Subramanian +1 more | 2004-08-03 |
| 6758612 | System and method for developer endpoint detection by reflectometry or scatterometry | Cyrus E. Tabery, Bharath Rangarajan, Ramkumar Subramanian | 2004-07-06 |
| 6753261 | In-situ chemical composition monitor on wafer during plasma etching for defect control | Khoi A. Phan, Arvind Halliyal | 2004-06-22 |
| 6752899 | Acoustic microbalance for in-situ deposition process monitoring and control | Arvind Halliyal, Michael K. Templeton | 2004-06-22 |
| 6746822 | Use of surface coupling agent to improve adhesion | Bharath Rangarajan, Michael K. Templeton | 2004-06-08 |
| 6741445 | Method and system to monitor and control electro-static discharge | Khoi A. Phan, Bharath Rangarajan, Ramkumar Subramanian | 2004-05-25 |
| 6727995 | Gate oxide thickness measurement and control using scatterometry | Arvind Halliyal, Ramkumar Subramanian | 2004-04-27 |
| 6724476 | Low defect metrology approach on clean track using integrated metrology | Khoi A. Phan, Bharath Rangarajan | 2004-04-20 |
| 6721046 | Monitoring of concentration of nitrogen in nitrided gate oxides, and gate oxide interfaces | Arvind Halliyal, Ramkumar Subramanian | 2004-04-13 |
| 6704101 | Scatterometry based measurements of a moving substrate | Bharath Rangarajan, Ramkumar Subramanian, Michael K. Templeton | 2004-03-09 |
| 6702648 | Use of scatterometry/reflectometry to measure thin film delamination during CMP | Steven C. Avanzino, Bharath Rangarajan, Ramkumar Subramanian | 2004-03-09 |