Issued Patents 2003
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6635575 | Methods and apparatus to enhance properties of Si-O-C low K films | Li-Qun Xia, Frederic Gaillard, Tian-Hoe Lim | 2003-10-21 |
| 6632478 | Process for forming a low dielectric constant carbon-containing film | Frederic Gaillard, Li-Qun Xia, Jen Shu, Tian-Hoe Lim | 2003-10-14 |
| 6627532 | Method of decreasing the K value in SiOC layer deposited by chemical vapor deposition | Frederic Gaillard, Li-Qun Xia, Tian-Hoe Lim, Wai-Fan Yau, Shin-Puu Jeng +2 more | 2003-09-30 |
| 6602806 | Thermal CVD process for depositing a low dielectric constant carbon-doped silicon oxide film | Li-Qun Xia, Fabrice Geiger, Frederic Gaillard, Tian-Hoe Lim | 2003-08-05 |
| 6599574 | Method and apparatus for forming a dielectric film using helium as a carrier gas | Paul Edward Gee, Li-Qun Xia, Francimar Campana, Shankar Venkataranan, Dana Tribula +1 more | 2003-07-29 |
| 6596343 | Method and apparatus for processing semiconductor substrates with hydroxyl radicals | Himanshu Pokharna, Shankar Chandran, Srinivas D. Nemani, Chen-An Chen, Francimar Campana +1 more | 2003-07-22 |
| 6593247 | Method of depositing low k films using an oxidizing plasma | Tzu-Fang Huang, Yung-Cheng Lu, Li-Qun Xia, Wai-Fan Yau, David Cheung +5 more | 2003-07-15 |
| 6589888 | Dual frequency plasma enhanced chemical vapor deposition of silicon carbide layers | Srinivas D. Nemani, Li-Qun Xia | 2003-07-08 |
| 6583497 | Surface treatment of c-doped SiO2 film to enhance film stability during O2 ashing | Li-Qun Xia, Tian-Hoe Lim, Frederic Gaillard | 2003-06-24 |
| 6573196 | Method of depositing organosilicate layers | Frederick Gaillard, Li-Qun Xia, Tian-Hoe Lim | 2003-06-03 |
| 6569257 | Method for cleaning a process chamber | Huong Nguyen, Michael Barnes, Li-Qun Xia | 2003-05-27 |
| 6531398 | Method of depositing organosillicate layers | Frederic Gaillard, Li-Qun Xia, Paul Fisher, Srinivas D. Nemani | 2003-03-11 |
| 6514850 | Interface with dielectric layer and method of making | Li-Qun Xia, Huong Nguyen, Dan Maydan | 2003-02-04 |
| 6511920 | Optical marker layer for etch endpoint determination | Huong Nguyen, Yunsang Kim, Li-Qun Xia | 2003-01-28 |
| 6503843 | Multistep chamber cleaning and film deposition process using a remote plasma that also enhances film gap fill | Li-Qun Xia | 2003-01-07 |