Issued Patents 2002
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6485355 | Method to increase removal rate of oxide using fixed-abrasive | Alexander William Simpson | 2002-11-26 |
| 6448169 | Apparatus and method for use in manufacturing semiconductor devices | William Brearley, Paul F. Findeis, Kimberley A. Kelly, Bouwe W. Leenstra, Arthur G. Merryman +4 more | 2002-09-10 |
| 6444919 | Thin film wiring scheme utilizing inter-chip site surface wiring | Mukta S. Farooq, Michael F. McAllister, Eric D. Perfecto, Chandrika Prasad, Keshav Prasad +3 more | 2002-09-03 |
| 6429149 | Low temperature LPCVD PSG/BPSG process | Ashima B. Chakravarti, Richard A. Conti, Byeongju Park | 2002-08-06 |
| 6403412 | Method for in-situ formation of bottle shaped trench by gas phase etching | Byeongju Park | 2002-06-11 |
| 6368969 | Chemical-mechanical polishing methods | Fen F. Jamin | 2002-04-09 |
| 6365328 | Semiconductor structure and manufacturing method | Hua Shen, David E. Kotecki, Satish D. Athavale, Jenny Lian, Fen F. Jamin +2 more | 2002-04-02 |
| 6359300 | High aspect ratio deep trench capacitor having void-free fill | Byeongju Park | 2002-03-19 |
| 6358850 | Slurry-less chemical-mechanical polishing of oxide materials | Sumit Pandey, Ronald J. Schutz, Ravikumar Ramachandran | 2002-03-19 |
| 6350692 | Increased polish removal rate of dielectric layers using fixed abrasive pads | Ravikumar Ramachandran, Alexander William Simpson | 2002-02-26 |
| 6335261 | Directional CVD process with optimized etchback | Wesley C. Natzle, Richard A. Conti, Thomas Ivers, George D. Papasouliotis | 2002-01-01 |