Issued Patents 2002
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6443811 | Ceria slurry solution for improved defect control of silicon dioxide chemical-mechanical polishing | Haruki Nojo, Jeremy Stephens, Ravikumar Ramachandran | 2002-09-03 |
| 6429131 | CMP uniformity | Chenting Lin, Robert van den Berg | 2002-08-06 |
| 6358850 | Slurry-less chemical-mechanical polishing of oxide materials | Laertis Economikos, Ronald J. Schutz, Ravikumar Ramachandran | 2002-03-19 |