Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12191113 | Systems and methods for optimizing full horizontal scanned beam distance | Tyler Wills, Eric D. Wilson, Jay T. Scheuer, Xiangdong He, Shardul S. Patel +1 more | 2025-01-07 |
| 11264205 | Techniques for determining and correcting for expected dose variation during implantation of photoresist-coated substrates | Eric D. Wilson | 2022-03-01 |
| 10431421 | Apparatus and techniques for beam mapping in ion beam system | Eric D. Wilson, Sruthi Chennadi, Daniel R. Tieger, Shane Conley | 2019-10-01 |
| 9738968 | Apparatus and method for controlling implant process | Morgan Evans, Stanislav S. Todorov, Norman E. Hussey, Gregory Gibilaro | 2017-08-22 |
| 9062377 | Reducing glitching in an ion implanter | William T. Levay, Bon-Woong Koo, Brant S. Binns, Richard M. White | 2015-06-23 |
| 9006692 | Apparatus and techniques for controlling ion implantation uniformity | Stanislav S. Todorov, Richard Allen Sprenkle, Norman E. Hussey, Frank Sinclair, Shengwu Chang +3 more | 2015-04-14 |
| 8853653 | Apparatus and techniques for controlling ion implantation uniformity | Stanislav S. Todorov, Richard Allen Sprenkle, Norman E. Hussey, Frank Sinclair, Shengwu Chang +3 more | 2014-10-07 |
| 8378318 | Fixed mask design improvements | Benjamin B. Riordon | 2013-02-19 |
| 7723706 | Horizontal and vertical beam angle measurement technique | Peter L. Kellerman | 2010-05-25 |
| 7663125 | Ion beam current uniformity monitor, ion implanter and related method | William G. Callahan, Morgan Evans, Norman E. Hussey, Gregg Norris, Joseph C. Olson | 2010-02-16 |
| 7476877 | Wafer charge monitoring | Russell J. Low, Peter F. Kurunczi, Eric R. Cobb | 2009-01-13 |
| 6891173 | Ion implantation systems and methods utilizing a downstream gas source | Paul A. Daniel | 2005-05-10 |
| 6723998 | Faraday system for ion implanters | Jack Bisson, Zhiyong Zhao, Daniel Alvarado, Craig Ian Walker | 2004-04-20 |
| 6528804 | Method and apparatus for low energy ion implantation | Philip Sullivan, Damian Brennan | 2003-03-04 |
| 5153430 | Method and apparatus for measuring the momentum, energy, power, and power density profile of intense particle beams | Henry W. Kugel | 1992-10-06 |