Issued Patents All Time
Showing 26–36 of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8268078 | Method and apparatus for reducing particle contamination in a deposition system | Kenji Suzuki, Masamichi Hara, Yasushi Mizusawa | 2012-09-18 |
| 8247030 | Void-free copper filling of recessed features using a smooth non-agglomerated copper seed layer | Kenji Suzuki, Miho Jomen | 2012-08-21 |
| 7913807 | Vehicle door structure | — | 2011-03-29 |
| 7892358 | System for introducing a precursor gas to a vapor deposition system | Kenji Suzuki | 2011-02-22 |
| D631584 | Rear combination lamp for an automobile | Saburou Hazumi | 2011-01-25 |
| 7858522 | Method for reducing carbon monoxide poisoning in a thin film deposition system | Kenji Suzuki | 2010-12-28 |
| 7717061 | Gas switching mechanism for plasma processing apparatus | Tadahiro Ishizaka, Naoki Yoshii, Kohei Kawamura, Yukio Fukuda, Takashi Shigeoka +3 more | 2010-05-18 |
| 7491430 | Deposition method for forming a film including metal, nitrogen and carbon | Tadahiro Ishizaka, Tatsuo Hatano | 2009-02-17 |
| 7078341 | Method of depositing metal layers from metal-carbonyl precursors | Hideaki Yamasaki, Tsukasa Matsuda, Tatsuo Hatano, Masahito Sugiura, Yumiko Kawano +3 more | 2006-07-18 |
| 6989321 | Low-pressure deposition of metal layers from metal-carbonyl precursors | Hideaki Yamasaki, Tsukasa Matsuda, Tatsuo Hatano, Masahito Sugiura, Yumiko Kawano +3 more | 2006-01-24 |
| 6924223 | Method of forming a metal layer using an intermittent precursor gas flow process | Hideaki Yamasaki, Tsukasa Matsuda, Tatsuo Hatano, Mitsuhiro Tachibana, Koumei Matsuzava +6 more | 2005-08-02 |