JO

Jon Opsal

TH Therma-Wave: 102 patents #1 of 60Top 2%
KL Kla-Tencor: 22 patents #48 of 1,394Top 4%
TL Tokyo Electron Limited: 1 patents #3,538 of 5,567Top 65%
📍 Livermore, CA: #5 of 2,185 inventorsTop 1%
🗺 California: #1,421 of 386,348 inventorsTop 1%
Overall (All Time): #9,012 of 4,157,543Top 1%
126
Patents All Time

Issued Patents All Time

Showing 76–100 of 126 patents

Patent #TitleCo-InventorsDate
6650415 Broadband spectroscopic rotating compensator ellipsometer David E. Aspnes 2003-11-18
6643354 Calibration and alignment of X-ray reflectometric systems Louis N. Koppel, Craig E. Uhrich 2003-11-04
6608689 Combination thin-film stress and thickness measurement device Lanhua Wei, Allan Rosencwaig 2003-08-19
6583875 Monitoring temperature and sample characteristics using a rotating compensator ellipsometer Lanhua Wei, Allan Rosencwaig 2003-06-24
6583876 Apparatus for optical measurements of nitrogen concentration in thin films Youxian Wen 2003-06-24
6577384 Spatial averaging technique for ellipsometry and reflectometry Lanhua Wei, Hanyou Chu 2003-06-10
6567213 Apparatus for analyzing multi-layer thin film stacks on semiconductors Allan Rosencwaig 2003-05-20
6535285 Combination thermal wave and optical spectroscopy measurement system Minna Hovinen 2003-03-18
6532070 Method for determining ion concentration and energy of shallow junction implants Minna Hovinen 2003-03-11
6522413 Apparatus for evaluating metalized layers on semiconductors Li-Yi Chen 2003-02-18
6515746 Thin film optical measurement system and method with calibrating ellipsometer Jeffrey T. Fanton, Craig E. Uhrich 2003-02-04
6512815 Apparatus for analyzing samples using combined thermal wave and X-ray reflectance measurements Allan Rosencwaig 2003-01-28
6465265 Analysis of interface layer characteristics Jingmin Leng 2002-10-15
6453006 Calibration and alignment of X-ray reflectometric systems Louis N. Koppel, Craig E. Uhrich 2002-09-17
6452685 Apparatus for evaluating metalized layers on semiconductors Li-Yi Chen 2002-09-17
6449043 Broadband spectroscopic rotating compensator ellipsometer David E. Aspnes 2002-09-10
6429943 Critical dimension analysis with simultaneous multiple angle of incidence measurements Allan Rosencwaig 2002-08-06
6417921 Apparatus for analyzing multi-layer thin film stacks on semiconductors Allan Rosencwaig 2002-07-09
6411385 Thin film optical measurement system and method with calibrating ellipsometer David E. Aspnes, Jeffrey T. Fanton 2002-06-25
6408048 Apparatus for analyzing samples using combined thermal wave and X-ray reflectance measurements Allan Rosencwaig 2002-06-18
6320657 Broadband spectroscopic rotating compensator ellipsometer David E. Aspnes 2001-11-20
6320666 Apparatus for evaluating metalized layers on semiconductors Li-Yi Chen 2001-11-20
6304326 Thin film optical measurement system and method with calibrating ellipsometer David E. Aspnes, Jeffrey T. Fanton 2001-10-16
6297880 Apparatus for analyzing multi-layer thin film stacks on semiconductors Allan Rosencwaig 2001-10-02
6281027 Spatial averaging technique for ellipsometry and reflectometry Lanhua Wei, Hanyou Chu 2001-08-28