Issued Patents All Time
Showing 26–50 of 167 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12094951 | Capping structures in semiconductor devices | Po-Chin Chang, Ming-Huan Tsai, Li-Te Lin | 2024-09-17 |
| 12087558 | Ion beam etching apparatus and method | Jung-Hao Chang, Po-Chin Chang, Li-Te Lin | 2024-09-10 |
| 12062576 | Semiconductor devices with a rare earth metal oxide layer | Han-Yu Lin, Szu-Hua Chen, Kuan-Kan Hu, Kenichi Sano, Po-Cheng Wang +2 more | 2024-08-13 |
| 12051620 | Semiconductor structure and method for manufacturing the same | Hung-Chang Sun, Po-Chin Chang, Akira Mineji, Zi-Wei Fang | 2024-07-30 |
| 12040372 | Contact structures in semiconductor devices | Hsu-Kai Chang, Jhih-Rong Huang, Yen-Tien Tung, Chia-Hung Chu, Shuen-Shin Liang +2 more | 2024-07-16 |
| 12033863 | Semiconductor fabrication system embedded with effective baking module | Han-Yu Lin, Yi-Ruei Jhan, Fang-Wei Lee, Li-Te Lin, Tze-Chung Lin | 2024-07-09 |
| 12034059 | Reducing pattern loading in the etch-back of metal gate | Po-Chin Chang, Wei-Hao Wu, Li-Te Lin | 2024-07-09 |
| 12021125 | High selectivity etching with germanium-containing gases | Tze-Chung Lin, Fang-Wei Lee, Li-Te Lin, Han-Yu Lin | 2024-06-25 |
| 12002663 | Processing apparatus and method for forming semiconductor structure | Yu-Rung Hsu, Li-Te Lin | 2024-06-04 |
| 11978672 | Semiconductor device with elongated pattern | Po-Chin Chang, Li-Te Lin | 2024-05-07 |
| 11978640 | Method of manufacturing semiconductor devices | Yi-Chen Lo, Yi-Shan Chen, Chih-Kai Yang | 2024-05-07 |
| 11973129 | Semiconductor device structure with inner spacer layer and method for forming the same | Han-Yu Lin, Chansyun David Yang, Fang-Wei Lee, Tze-Chung Lin, Li-Te Lin | 2024-04-30 |
| 11929424 | Semiconductor device and method for forming the same | Yi-Chen Lo, Li-Te Lin | 2024-03-12 |
| 11925033 | Embedded backside memory on a field effect transistor | Kuan-Liang Liu, Sheng-Chau Chen, Chung-Liang Cheng, Chia-Shiung Tsai, Yeong-Jyh Lin +1 more | 2024-03-05 |
| 11908685 | Methods of reducing gate spacer loss during semiconductor manufacturing | Yi-Ruei Jhan, Han-Yu Lin, Li-Te Lin | 2024-02-20 |
| 11881401 | Method of forming metal features | Po-Chin Chang, Li-Te Lin, Ru-Gun Liu, Wei-Liang Lin, Yu-Tien Shen +1 more | 2024-01-23 |
| 11862465 | Fine line patterning methods | Shih-Chun Huang, Chiu-Hsiang Chen, Ya-Wen Yeh, Yu-Tien Shen, Po-Chin Chang +7 more | 2024-01-02 |
| 11855215 | Semiconductor device structure with high contact area | Shuen-Shin Liang, Pang-Yen Tsai, Keng-Chu Lin, Sung-Li Wang | 2023-12-26 |
| 11855192 | Semiconductor device and manufacturing method thereof | Han-Yu Lin, Fang-Wei Lee, Kai Tak Lam, Raghunath PUTIKAM, Tzer-Min Shen +4 more | 2023-12-26 |
| 11843041 | Gate etch back with reduced loading effect | Yi-Chen Lo, Jung-Hao Chang, Li-Te Lin | 2023-12-12 |
| 11830928 | Inner spacer formation in multi-gate transistors | Han-Yu Lin, Chansyun David Yang, Tze-Chung Lin, Fang-Wei Lee, Fo-Ju Lin +1 more | 2023-11-28 |
| 11810960 | Contact structures in semiconductor devices | Sung-Li Wang, Hsu-Kai Chang, Jhih-Rong Huang, Yen-Tien Tung, Chia-Hung Chu +1 more | 2023-11-07 |
| 11707803 | Apparatus and method for directional etch with micron zone beam and angle control | Chansyun David Yang, Li-Te Lin | 2023-07-25 |
| 11652152 | Capping structures in semiconductor devices | Po-Chin Chang, Ming-Huan Tsai, Li-Te Lin | 2023-05-16 |
| 11651972 | Method of manufacturing semiconductor devices using directional process | Ya-Wen Yeh, Yu-Tien Shen, Shih-Chun Huang, Po-Chin Chang, Wei-Liang Lin +4 more | 2023-05-16 |