Issued Patents All Time
Showing 51–75 of 167 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11646234 | Method for FinFET fabrication and structure thereof | Han-Yu Lin, Yi-Ruei Jhan, Fang-Wei Lee, Tze-Chung Lin, Chao-Hsien Huang +2 more | 2023-05-09 |
| 11626506 | Reducing pattern loading in the etch-back of metal gate | Po-Chin Chang, Wei-Hao Wu, Li-Te Lin | 2023-04-11 |
| 11605728 | Semiconductor device structure with inner spacer layer | Han-Yu Lin, Chansyun David Yang, Fang-Wei Lee, Tze-Chung Lin, Li-Te Lin | 2023-03-14 |
| 11597053 | Polishing pad, method for manufacturing polishing pad, and polishing method | Chi-Hao Huang, Hsuan-Pang Liu, Yuan-Chun Sie, Cheng-Chung Chien | 2023-03-07 |
| 11581222 | Via in semiconductor device structure | Chun-Jui Huang, Li-Te Lin | 2023-02-14 |
| 11551966 | Method of forming semiconductor structure having layer with re-entrant profile | Yi-Shan Chen, Chan Syun David Yang, Li-Te Lin | 2023-01-10 |
| 11545397 | Spacer structure for semiconductor device and method for forming the same | Han-Yu Lin, Jhih-Rong Huang, Yen-Tien Tung, Tzer-Min Shen, Fu-Ting Yen +3 more | 2023-01-03 |
| 11522065 | Gate etch back with reduced loading effect | Yi-Chen Lo, Jung-Hao Chang, Li-Te Lin | 2022-12-06 |
| 11489057 | Contact structures in semiconductor devices | Hsu-Kai Chang, Jhih-Rong Huang, Yen-Tien Tung, Chia-Hung Chu, Shuen-Shin Liang +2 more | 2022-11-01 |
| 11469143 | Semiconductor device with elongated pattern | Po-Chin Chang, Li-Te Lin | 2022-10-11 |
| 11424341 | Semiconductor device | Yi-Chen Lo, Li-Te Lin | 2022-08-23 |
| 11417751 | Semiconductor device structure and method for forming the same | Tze-Chung Lin, Han-Yu Lin, Li-Te Lin | 2022-08-16 |
| 11393704 | Semiconductor processing device | Yii-Cheng Lin, Chih-Ming Sun | 2022-07-19 |
| 11393924 | Structure and formation method of semiconductor device with high contact area | Shuen-Shin Liang, Pang-Yen Tsai, Keng-Chu Lin, Sung-Li Wang | 2022-07-19 |
| 11373902 | Semiconductor structure and method for manufacturing the same | Hung-Chang Sun, Po-Chin Chang, Akira Mineji, Zi-Wei Fang | 2022-06-28 |
| 11373878 | Technique for semiconductor manufacturing | Han-Yu Lin, Li-Te Lin, Tze-Chung Lin, Fang-Wei Lee, Yi-Lun Chen +4 more | 2022-06-28 |
| 11351635 | Apparatus and method for directional etch with micron zone beam and angle control | Chansyun David Yang, Li-Te Lin | 2022-06-07 |
| 11239078 | Fine line patterning methods | Shih-Chun Huang, Chiu-Hsiang Chen, Ya-Wen Yeh, Yu-Tien Shen, Po-Chin Chang +7 more | 2022-02-01 |
| 11222794 | Semiconductor fabrication system embedded with effective baking module | Han-Yu Lin, Yi-Ruei Jhan, Fang-Wei Lee, Li-Te Lin, Tze-Chung Lin | 2022-01-11 |
| 11217487 | Semiconductor arrangement and method of manufacture | Yi-Chen Lo, Li-Te Lin | 2022-01-04 |
| 11201243 | Nanowire stack GAA device and methods for producing the same | Chansyun David Yang, Han-Yu Lin, Chun-Yu Chen, Chih-Ching Wang, Fang-Wei Lee +3 more | 2021-12-14 |
| 11195759 | Semiconductor arrangement and method for making | Wei-Lun Chen, Chao-Hsien Huang, Li-Te Lin | 2021-12-07 |
| 11183580 | Structure and formation method of semiconductor device with metal gate stack | Jung-Hao Chang, Li-Te Lin | 2021-11-23 |
| 11152491 | Method for forming semiconductor device structure with inner spacer layer | Han-Yu Lin, Chansyun David Yang, Fang-Wei Lee, Tze-Chung Lin, Li-Te Lin | 2021-10-19 |
| 11107904 | Inner spacer formation in multi-gate transistors | Han-Yu Lin, Chansyun David Yang, Tze-Chung Lin, Fang-Wei Lee, Fo-Ju Lin +1 more | 2021-08-31 |