Issued Patents All Time
Showing 176–200 of 202 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10164066 | FinFET devices and methods of forming | Chia-Cheng Chen, Liang-Yin Chen | 2018-12-25 |
| 10157995 | Integrating junction formation of transistors with contact formation | Li-Ting Wang, Teng-Chun Tsai, Chun-Hsiung Lin, Cheng-Tung Lin, Chi-Yuan Chen +1 more | 2018-12-18 |
| 10115808 | finFET device and methods of forming | Yu-Chang Lin, Chun-Feng Nieh, Tien-Shun Chang, Wei-Ting Chien, Chih-Pin Tsao +1 more | 2018-10-30 |
| 10056383 | Enhanced channel strain to reduce contact resistance in NMOS FET devices | Yu-Chang Lin, Chun-Feng Nieh, Hou-Yu Chen, Yong-Yan Lu | 2018-08-21 |
| 10014382 | Semiconductor device with sidewall passivation and method of making | Mrunal A. Khaderbad, Hsueh Wen Tsau, Chia-Ching Lee, Da-Yuan Lee, Hsiao-Kuan Wei +2 more | 2018-07-03 |
| 9812451 | Field effect transistor contact with reduced contact resistance | Su-Hao Liu, Yan-Ming Tsai, Chung-Ting Wei, Ziwei Fang, Chih-Wei Chang +1 more | 2017-11-07 |
| 9735107 | Contact structure and formation thereof | Hong-Mao Lee, Chia-Han Lai, Chi-Hsuan Ni, Cheng-Tung Lin, Huang-Yi Huang +4 more | 2017-08-15 |
| 9660031 | Integrated circuit device having III-V compound semiconductor region comprising magnesium and N-type impurity and overlying III-V compound semiconductor layer formed without Cp2Mg precursor | Hung-Ta Lin, Meng-Ku Chen, Pang-Yen Tsai | 2017-05-23 |
| 9607838 | Enhanced channel strain to reduce contact resistance in NMOS FET devices | Yu-Chang Lin, Chun-Feng Nieh, Hou-Yu Chen, Yong-Yan Lu | 2017-03-28 |
| 9537010 | Semiconductor device structure and method for forming the same | Tsan-Chun Wang, Ziwei Fang, Chien-Tai Chan, Da-Wen Lin | 2017-01-03 |
| 9508716 | Methods of manufacturing a semiconductor device | Cheng-Tung Lin, Teng-Chun Tsai, Li-Ting Wang, Chi-Yuan Chen, Kuo-Yin Lin +5 more | 2016-11-29 |
| 9412836 | Contacts for transistors | Li-Ting Wang, Teng-Chun Tsai, Cheng-Tung Lin, Hung-Ta Lin | 2016-08-09 |
| 9397169 | Epitaxial structures | Meng-Ku Chen, Hung-Ta Lin, Pang-Yen Tsai | 2016-07-19 |
| 9356102 | Double stepped semiconductor substrate | Meng-Ku Chen, Hung-Ta Lin | 2016-05-31 |
| 9287170 | Contact structure and formation thereof | Hong-Mao Lee, Teng-Chun Tsai, Li-Ting Wang, Chi-Yuan Chen, Cheng-Tung Lin +4 more | 2016-03-15 |
| 9224815 | Method of tuning doping concentration in III-V compound semiconductor through co-doping donor and acceptor impurities | Meng-Ku Chen, Hung-Ta Lin, Pang-Yen Tsai | 2015-12-29 |
| 9123564 | Semiconductor device with conformal doping and method of making | Yu-Chang Lin, Wen-Tai Lu, Li-Ting Wang, Chun-Feng Nieh, Hou-Yu Chen | 2015-09-01 |
| 9099311 | Double stepped semiconductor substrate | Meng-Ku Chen, Hung-Ta Lin | 2015-08-04 |
| 9064959 | Method and apparatus for forming a CMOS device | Li-Ting Wang, Teng-Chun Tsai, Chun-Hsiung Lin, Cheng-Tung Lin, Chi-Yuan Chen +3 more | 2015-06-23 |
| 9048087 | Methods for wet clean of oxide layers over epitaxial layers | Li-Lan Wu, Chi-Yuan Chen, Ming Chyi Liu, Cary Chia-Chiung Lo, Teng-Chun Tsai +5 more | 2015-06-02 |
| 9029246 | Methods of forming epitaxial structures | Meng-Ku Chen, Hung-Ta Lin, Pang-Yen Tsai | 2015-05-12 |
| 8927362 | CMOS device and method of forming the same | Kuo-Cheng Ching, Shi Ning Ju, Cary Chia-Chiung Lo, Chun Chung Su | 2015-01-06 |
| 8822290 | FinFETs and methods for forming the same | Hung-Ta Lin, Meng-Ku Chen | 2014-09-02 |
| 8680576 | CMOS device and method of forming the same | Kuo-Cheng Ching, Shi Ning Ju, Cary Chia-Chiung Lo, Chun Chung Su | 2014-03-25 |
| 8497177 | Method of making a FinFET device | Jeff J. Xu, Hung-Ta Lin, Chun-Feng Nieh | 2013-07-30 |