Issued Patents All Time
Showing 51–75 of 155 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7147994 | Top ARC polymers, method of preparation thereof and top ARC compositions comprising the same | — | 2006-12-12 |
| 7138218 | Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator | Sung Koo Lee, Geun Su Lee, Ki Soo Shin | 2006-11-21 |
| 7108957 | Organic anti-reflective coating composition and method for forming photoresist patterns using the same | Ki Soo Shin | 2006-09-19 |
| 7081325 | Photoresist polymer and photoresist composition including the same | Sung Koo Lee | 2006-07-25 |
| 7033729 | Light absorbent agent polymer for organic anti-reflective coating and preparation method and organic anti-reflective coating composition comprising the same | Keun Kyu Kong, Seok Kyun Kim | 2006-04-25 |
| 6998442 | Organic anti-reflective coating polymers, anti-reflective coating composition comprising the same and preparation methods thereof | Min Ho Jung, Geun Su Lee, Ki Soo Shin | 2006-02-14 |
| 6987155 | Polymers for photoresist and photoresist compositions using the same | Chi Hyeong Roh | 2006-01-17 |
| 6984482 | Top-coating composition for photoresist and process for forming fine pattern using the same | Keun Kyu Kong, Hyeong Soo Kim, Jin-Soo Kim, Cha-Won Koh, Sung-Eun Hong +3 more | 2006-01-10 |
| 6924078 | Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion | Geun Su Lee, Ki Soo Shin, Se Jin Choi, Deog-Bae Kim, Jae-Hyun Kim | 2005-08-02 |
| 6921622 | Photoresist monomers, polymers thereof and photoresist compositions containing the same | Geun Su Lee, Ki Soo Shin | 2005-07-26 |
| 6916594 | Overcoating composition for photoresist and method for forming photoresist pattern using the same | Cheol Kyu Bok, Seung Chan Moon, Ki Soo Shin | 2005-07-12 |
| 6875956 | Method of forming photoresist pattern using hot plate oven | Jin-Soo Kim, Ki Soo Shin | 2005-04-05 |
| 6866984 | ArF photoresist copolymers | Cheol Kyu Bok, Ki Ho Baik | 2005-03-15 |
| 6858371 | Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the same | Geun Su Lee, Min Ho Jung, Cha-Won Koh, Ki Soo Shin | 2005-02-22 |
| 6849375 | Photoresist monomers, polymers thereof and photoresist compositions containing the same | Geun Su Lee, Ki Soo Shin | 2005-02-01 |
| 6841526 | Cleaning solution for removing photoresist | Geun Su Lee, Ki Soo Shin | 2005-01-11 |
| 6835532 | Organic anti-reflective coating composition and method for forming photoresist patterns using the same | — | 2004-12-28 |
| 6824951 | Photoresist composition for resist flow process | Geun Su Lee, Jin-Soo Kim, Min Ho Jung, Ki Ho Baik | 2004-11-30 |
| 6818376 | Cross-linker monomer comprising double bond and photoresist copolymer containing the same | Geun Su Lee, Ki Ho Baik | 2004-11-16 |
| 6811960 | Partially crosslinked polymer for bilayer photoresist | Geun Su Lee, Min Ho Jung, Ki Ho Baik | 2004-11-02 |
| 6808859 | ArF photoresist copolymers | Cheol Kyu Bok, Ki Ho Baik | 2004-10-26 |
| 6806025 | Photoresist monomers, polymers thereof and photoresist compositons containing the same | Geun Su Lee, Ki Soo Shin | 2004-10-19 |
| 6797451 | Reflection-inhibiting resin used in process for forming photoresist pattern | Sung-Eun Hong, Min Ho Jung, Hyeong Soo Kim, Ki Ho Baik | 2004-09-28 |
| 6787285 | Pattern width slimming-inhibiting method of photoresist pattern using photoresist composition containing thermal acid generator | Keun Kyu Kong, Gyu-Dong Park, Ki Soo Shin | 2004-09-07 |
| 6770415 | Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same | Geun Su Lee, Cha-Won Koh, Min Ho Jung, Ki Ho Baik | 2004-08-03 |