Issued Patents All Time
Showing 26–50 of 155 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7494935 | Method for forming fine pattern of semiconductor device | Seung Chan Moon, Cheol Kyu Bok, Myoung Ja Min, Keun Do Ban, Hee Youl Lim | 2009-02-24 |
| 7462439 | Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same | Cheol Kyu Bok, Chang Moon Lim, Seung Chan Moon | 2008-12-09 |
| 7419760 | Top anti-reflective coating composition, method for forming the pattern of a semiconductor device using the same, and semiconductor device comprising the pattern | Cheol Kyu Bok, Sam Young Kim, Chang Moon Lim, Seung Chan Moon | 2008-09-02 |
| 7381519 | Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same | Cheol Kyu Bok, Chang Moon Lim, Seung Chan Moon | 2008-06-03 |
| 7374868 | Composition for an organic bottom anti-reflective coating and method for forming pattern using the same | — | 2008-05-20 |
| 7361447 | Photoresist polymer and photoresist composition containing the same | — | 2008-04-22 |
| 7329477 | Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same | Keun Kyu Kong, Hyeong Soo Kim, Jin-Soo Kim, Cha-Won Koh, Sung-Eun Hong +3 more | 2008-02-12 |
| 7326525 | Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same | — | 2008-02-05 |
| 7314810 | Method for forming fine pattern of semiconductor device | — | 2008-01-01 |
| 7303858 | Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor device | Cheol Kyu Bok, Chang Moon Lim, Seung Chan Moon | 2007-12-04 |
| 7300880 | Methods for forming fine photoresist patterns | Young Sun Hwang | 2007-11-27 |
| 7288364 | Top anti-reflective coating composition and method for pattern formation of semiconductor device using the same | Cheol Kyu Bok, Sam Young Kim, Chang Moon Lim, Seung Chan Moon | 2007-10-30 |
| 7285370 | Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same | Keun Kyu Kong, Jin-Soo Kim | 2007-10-23 |
| 7282318 | Photoresist composition for EUV and method for forming photoresist pattern using the same | — | 2007-10-16 |
| 7270937 | Over-coating composition for photoresist and process for forming photoresist pattern using the same | — | 2007-09-18 |
| 7270933 | Organic anti-reflective coating composition and method for forming photoresist pattern using the same | — | 2007-09-18 |
| 7267924 | Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same | — | 2007-09-11 |
| 7235349 | Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator | Sung Koo Lee, Geun Su Lee, Ki Soo Shin | 2007-06-26 |
| 7220679 | Method for forming patterns in a semiconductor device | Sung Koo Lee, Young Sun Hwang, Cheol Kyu Bok, Ki Soo Shin | 2007-05-22 |
| 7208260 | Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the same | Keun Kyu Kong, Min Ho Jung, Geun Su Lee, Ki Ho Balk | 2007-04-24 |
| 7205089 | Cross-linking polymer for organic anti-reflective coating, organic anti-reflective coating composition comprising the same and method for forming photoresist pattern using the same | Cheol Kyu Bok, Seung Chan Moon, Ki Soo Shin | 2007-04-17 |
| 7186496 | Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same | Keun Kyu Kong, Young Sik Kim | 2007-03-06 |
| 7175974 | Organic anti-reflective coating composition and method for forming photoresist patterns using the same | Ki Soo Shin | 2007-02-13 |
| 7160668 | Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same | Keun Kyu Kong, Young Sik Kim | 2007-01-09 |
| 7150961 | Additive for photoresist composition for resist flow process | Min Ho Jung, Sung-Eun Hong, Geun Su Lee, Ki Ho Baik | 2006-12-19 |