Issued Patents All Time
Showing 76–100 of 155 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6770414 | Additive for photoresist composition for resist flow process | Min Ho Jung, Sung-Eun Hong, Geun Su Lee, Ki Ho Baik | 2004-08-03 |
| 6770720 | Organic polymer for organic anti-reflective coating layer and preparation thereof | Keun Kyu Kong, Min Ho Jung, Sung-Eun Hong, Ki Ho Baik | 2004-08-03 |
| 6764806 | Over-coating composition for photoresist, and processes for forming photoresist patterns using the same | Keun Kyu Kong, Cha-Won Koh, Jin-Soo Kim, Ki Ho Baik | 2004-07-20 |
| 6764964 | Method for forming patterns of a semiconductor device | Young Sun Hwang, Sung Koo Lee, Chcol-kyu Bok, Ki Soo Shin | 2004-07-20 |
| 6753448 | Photoresist monomers, polymers thereof and photoresist compositions using the same | Geun Su Lee, Ki Ho Baik | 2004-06-22 |
| 6753128 | Photoresist additive for preventing acid migration and photoresist composition comprising the same | Geun Su Lee, Ki Soo Shin | 2004-06-22 |
| 6749990 | Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same | Geun Su Lee, Ki Soo Shin | 2004-06-15 |
| 6737217 | Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same | Geun Su Lee, Ki Soo Shin | 2004-05-18 |
| 6720129 | Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same | Geun Su Lee, Ki Soo Shin | 2004-04-13 |
| 6699644 | Process for forming a photoresist pattern comprising alkaline treatment | Geun Su Lee, Hyeong Soo Kim, Jin-Soo Kim, Cha-Won Koh, Sung-Eun Hong +2 more | 2004-03-02 |
| 6692891 | Photoresist composition containing photo radical generator with photoacid generator | Geun Su Lee, Min Ho Jung, Ki Ho Baik | 2004-02-17 |
| 6686123 | Photoresist monomer, polymer thereof and photoresist composition containing the same | Geun Su Lee, Min Ho Jung | 2004-02-03 |
| 6664031 | Process for forming photoresist pattern by using gas phase amine treatment | Cha-Won Koh, Jin-Soo Kim, Sung-Eun Hong, Keun Kyu Kong, Ki Ho Baik | 2003-12-16 |
| 6653047 | Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same | Geun Su Lee, Ki Soo Shin | 2003-11-25 |
| 6632903 | Polymer-containing photoresist, and process for manufacturing the same | Min Ho Jung, Cheol Kyu Bok, Ki Ho Baik | 2003-10-14 |
| 6627384 | Photoresist composition for resist flow process and process for forming a contact hole using the same | Hyeong Soo Kim | 2003-09-30 |
| 6627383 | Photoresist monomer comprising bisphenol derivatives and polymers thereof | Geun Su Lee, Min Ho Jung, Ki Ho Baik | 2003-09-30 |
| 6627379 | Photoresist composition for resist flow process, and process for forming contact hole using the same | Jin-Soo Kim, Geun Su Lee, Ki Ho Baik | 2003-09-30 |
| 6613493 | Photoresist polymer and composition having nitro groups | Geun Su Lee, Ki Soo Shin | 2003-09-02 |
| 6610616 | Method for forming micro-pattern of semiconductor device | Cha-Won Koh, Sung-Eun Hong, Min Ho Jung, Jin-Soo Kim, Geun Su Lee | 2003-08-26 |
| 6608158 | Copolymer resin, preparation thereof, and photoresist using the same | Min Ho Jung, Cheol Kyu Bok, Ki Ho Baik | 2003-08-19 |
| 6602650 | Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and methods of preparation thereof | Sung-Eun Hong, Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2003-08-05 |
| 6599678 | Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and method of preparation thereof | Sung-Eun Hong, Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2003-07-29 |
| 6593446 | Organic polymer for organic anti-reflective coating layer and preparation thereof | Keun Kyu Kong, Min Ho Jung, Sung-Eun Hong, Geun Su Lee, Ki Ho Baik | 2003-07-15 |
| 6589707 | Partially crosslinked polymer for bilayer photoresist | Geun Su Lee, Min Ho Jung, Ki Ho Baik | 2003-07-08 |