Issued Patents All Time
Showing 126–150 of 155 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6376632 | Photoresist polymers of carboxyl-containing alicyclic compounds | Geun Su Lee, Min Ho Jung, Cheol Kyu Bok, Ki Ho Baik | 2002-04-23 |
| 6372935 | Copolymer resin, preparation thereof, and photoresist using the same | Min Ho Jung, Cheol Kyu Bok, Ki Ho Baik | 2002-04-16 |
| 6368771 | Photoresist polymers and photoresist compositions containing the same | Cha-Won Koh, Geun Su Lee, Myoung Soo Kim | 2002-04-09 |
| 6368773 | Photoresist cross-linker and photoresist composition comprising the same | Keun Kyu Kong, Myoung Soo Kim, Hyoung Gi Kim, Hyeong Soo Kim, Ki Ho Baik +1 more | 2002-04-09 |
| 6369181 | Copolymer resin, preparation thereof, and photoresist using the same | Min Ho Jung, Cheol Kyu Bok, Ki Ho Baik | 2002-04-09 |
| 6368770 | Photoresist monomers, polymers thereof, and photoresist compositions containing the same | Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2002-04-09 |
| 6359153 | Photoresist monomers and preparation thereof | Geun Su Lee, Chang-Il Choi, Hyeong Soo Kim, Jin-Soo Kim, Min Ho Jung +1 more | 2002-03-19 |
| 6322948 | Photoresist cross-linker and photoresist composition comprising the same | Keun Kyu Kong, Jin-Soo Kim, Ki Ho Baik | 2001-11-27 |
| 6319654 | Process for forming a photoresist pattern by top surface imaging process | Myoung Soo Kim, Hyung Gi Kim, Ki Ho Baik | 2001-11-20 |
| 6316162 | Polymer and a forming method of a micro pattern using the same | Myoung Soo Kim, Hyung Gi Kim, Chi Hyeong Roh, Geun Su Lee, Min Ho Jung +2 more | 2001-11-13 |
| 6316565 | Amide- or imide-introduced copolymer, preparation thereof and a photoresist comprising the same | Chi Hyeong Roh | 2001-11-13 |
| 6312865 | Semiconductor device using polymer-containing photoresist, and process for manufacturing the same | Min Ho Jung, Cheol Kyu Bok, Ki Ho Baik | 2001-11-06 |
| 6312868 | Photoresist cross-linker and photoresist composition comprising the same | Keun Kyu Kong, Myoung Soo Kim, Hyoung Gi Kim, Hyeong Soo Kim, Ki Ho Baik | 2001-11-06 |
| 6291131 | Monomers for photoresist, polymers thereof, and photoresist compositions using the same | Chi Hyeong Roh, Min Ho Jung, Keun Kyu Kong, Geun Su Lee, Ki Ho Baik | 2001-09-18 |
| 6265130 | Photoresist polymers of carboxyl-containing alicyclic compounds | Geun Su Lee, Min Ho Jung, Cheol Kyu Bok, Ki Ho Baik | 2001-07-24 |
| 6248847 | Copolymer resin, preparation thereof, and photoresist using the same | Min Ho Jung, Cheol Kyu Bok, Ki Ho Baik | 2001-06-19 |
| 6235447 | Photoresist monomers, polymers thereof, and photoresist compositions containing the same | Geun Su Lee, Cha-Won Koh, Min Ho Jung, Ki Ho Baik | 2001-05-22 |
| 6235448 | Photoresist monomers, polymers thereof, and photoresist compositions containing the same | Geun Su Lee, Min Ho Jung, Cheol Kyu Bok, Ki Ho Baik | 2001-05-22 |
| 6225020 | Polymer and a forming method of a micro pattern using the same | Myoung Soo Kim, Hyung Gi Kim, Chi Hyeong Roh, Geun Su Lee, Min Ho Jung +2 more | 2001-05-01 |
| 6200731 | Photoresist cross-linking monomers, photoresist polymers and photoresist compositions comprising the same | Geun Su Lee, Cha-Won Koh, Min Ho Jung, Ki Ho Baik | 2001-03-13 |
| 6190837 | Method for forming photoresist film pattern | Hyang Gi Kim | 2001-02-20 |
| 6165672 | Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin | Keun Kyu Kong, Cheol Kyu Bok, Ki Ho Baik | 2000-12-26 |
| 6150069 | Oxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same | Chi Hyeong Roh, Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2000-11-21 |
| 6143463 | Method and photoresist using a photoresist copolymer | Cheol Kyu Bok, Ki Ho Baik | 2000-11-07 |
| 6132926 | ArF photoresist copolymers | Cheol Kyu Bok, Ki Ho Baik | 2000-10-17 |