Issued Patents All Time
Showing 101–125 of 155 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6586619 | Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same | Geun Su Lee, Cha-Won Koh, Min Ho Jung, Ki Ho Baik | 2003-07-01 |
| 6582883 | Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof | Sung-Eun Hong, Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2003-06-24 |
| 6573012 | Photoresist monomers, polymers thereof and photoresist compositions using the same | Geun Su Lee, Ki Ho Baik | 2003-06-03 |
| 6569971 | Polymers for photoresist and photoresist compositions using the same | Chi Hyeong Roh | 2003-05-27 |
| 6569599 | Partially crosslinked polymer for bilayer photoresist | Geun Su Lee, Min Ho Jung, Ki Ho Baik | 2003-05-27 |
| 6562925 | Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof | Sung-Eun Hong, Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2003-05-13 |
| 6548613 | Organic anti-reflective coating polymer and preparation thereof | Min Ho Jung, Sung-Eun Hong, Geun Su Lee, Ki Ho Baik | 2003-04-15 |
| 6531562 | Photoresist monomer, polymer thereof and photoresist composition containing it | Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2003-03-11 |
| 6514665 | Additives for improving post exposure delay stability of photoresist | Keun Kyu Kong, Geun Su Lee, Ki Ho Baik | 2003-02-04 |
| 6489432 | Organic anti-reflective coating polymer and preparation thereof | Min Ho Jung, Sung-Eun Hong, Geun Su Lee, Ki Ho Baik | 2002-12-03 |
| 6486283 | Organic anti-reflective coating polymer, anti-reflective coating composition methods of preparation thereof | Sung-Eun Hong, Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2002-11-26 |
| 6482565 | Photoresist cross-linker and photoresist composition comprising the same | Keun Kyu Kong, Myoung Soo Kim, Hyoung Gi Kim, Hyeong Soo Kim, Ki Ho Baik | 2002-11-19 |
| 6465147 | Cross-linker for photoresist, and process for forming a photoresist pattern using the same | Geun Su Lee, Min Ho Jung, Ki Ho Baik | 2002-10-15 |
| 6455226 | Photoresist polymers and photoresist composition containing the same | Geun Su Lee, Hyeong Soo Kim, Ki Ho Baik | 2002-09-24 |
| 6455225 | Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the same | Keun Kyu Kong, Geun Su Lee, Ki Ho Baik | 2002-09-24 |
| 6448352 | Photoresist monomer, polymer thereof and photoresist composition containing it | Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2002-09-10 |
| 6426171 | Photoresist monomer, polymer thereof and photoresist composition containing it | Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2002-07-30 |
| 6416926 | Thiabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same | Chi Hyeong Roh, Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2002-07-09 |
| 6410670 | Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same | Geun Su Lee, Cha-Won Koh, Min Ho Jung, Ki Ho Baik | 2002-06-25 |
| 6403287 | Process for forming a photoresist pattern improving resistance to post exposure delay effect | Jin-Soo Kim, Hyoung Gi Kim | 2002-06-11 |
| 6403281 | Cross-linker monomer comprising double bond and photoresist copolymer containing the same | Geun Su Lee, Ki Ho Baik | 2002-06-11 |
| 6399272 | Phenylenediamine derivative-type additive useful for a chemically amplified photoresist | Geun Su Lee, Cha-Won Koh, Min Ho Jung, Ki Ho Baik | 2002-06-04 |
| 6399792 | Photoresist cross-linker and photoresist composition comprising the same | Keun Kyu Kong, Myoung Soo Kim, Hyoung Gi Kim, Hyeong Soo Kim, Ki Ho Baik | 2002-06-04 |
| 6395451 | Photoresist composition containing photo base generator with photo acid generator | Keun Kyu Kong, Jin-Soo Kim, Ki Ho Baik | 2002-05-28 |
| 6391518 | Polymers and photoresist compositions using the same | Min Ho Jung, Geun Su Lee, Ki Ho Baik | 2002-05-21 |