TK

Tomohiro Kobayashi

SC Shin-Etsu Chemical Co.: 74 patents #30 of 2,176Top 2%
FC Funai Electric Co.: 11 patents #86 of 943Top 10%
KT Kabushiki Kaisha Toshiba: 7 patents #4,294 of 21,451Top 25%
Mitsubishi Electric: 6 patents #4,940 of 25,717Top 20%
NI Nidec: 4 patents #253 of 976Top 30%
MC Mitsui Chemicals: 3 patents #648 of 2,279Top 30%
JT Japan Tobacco: 2 patents #330 of 1,187Top 30%
RI Riken: 2 patents #375 of 1,824Top 25%
TC Tamron Co.: 1 patents #74 of 138Top 55%
FC Furukawa Co.: 1 patents #36 of 90Top 40%
IC Ibiden Co.: 1 patents #451 of 730Top 65%
SC Sumitomo Precision Products Co.: 1 patents #87 of 199Top 45%
Fujitsu Limited: 1 patents #14,843 of 24,456Top 65%
Overall (All Time): #11,442 of 4,157,543Top 1%
112
Patents All Time

Issued Patents All Time

Showing 76–100 of 112 patents

Patent #TitleCo-InventorsDate
8083015 Hybrid vehicle 2011-12-27
8059481 Semiconductor memory device 2011-11-15
8057981 Resist composition, resist protective coating composition, and patterning process Yuji Harada, Jun Hatakeyama, Kazunori Maeda 2011-11-15
8043788 Resist composition and patterning process Jun Hatakeyama, Yuji Harada 2011-10-25
8024604 Information processing apparatus and error processing 2011-09-20
7847587 Semiconductor integrated circuit 2010-12-07
7830736 Semiconductor integrated circuit device and redundancy method thereof Takehiko Hojo, Tetsuya Amano 2010-11-09
7807331 Hydrogenated ring-opening metathesis polymer, resist composition and patterning process Takeshi Kinsho, Takeru Watanabe, Tadahiro Sunaga, Yuichi Okawa 2010-10-05
7794915 Hydrogenated ring-opening metathesis polymer, resist composition comprising the same and patterning method Tadahiro Sunaga, Yuichi Okawa, Takeshi Kinsho 2010-09-14
7727704 Positive resist compositions and patterning process Ryosuke Taniguchi, Tsunehiro Nishi 2010-06-01
7718342 Polymers, resist compositions and patterning process Kenji Funatsu, Koji Hasegawa, Tsunehiro Nishi 2010-05-18
7691561 Positive resist compositions and patterning process Ryosuke Taniguchi, Tsunehiro Nishi 2010-04-06
7629108 Nitrogen-containing organic compound, resist composition and patterning process Takeru Watanabe, Youichi Ohsawa, Masaki Ohashi, Wataru Kusaki 2009-12-08
7601479 Polymer, resist composition and patterning process Seiichiro Tachibana, Tsunehiro Nishi 2009-10-13
7598016 Resist composition and patterning process Jun Hatakeyama, Yuji Harada 2009-10-06
7537880 Polymer, resist composition, and patterning process Yuji Harada, Jun Hatakeyama, Takao Yoshihara, Wataru Kusaki, Koji Hasegawa 2009-05-26
7334239 Optical disc apparatus 2008-02-19
7303852 Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method Jun Hatakeyama, Youichi Ohsawa 2007-12-04
7211367 Photo acid generator, chemical amplification resist material Satoshi Watanabe, Tsunehiro Nishi, Youichi Ohsawa, Katsuhiro Kobayashi 2007-05-01
7105267 Resist compositions and patterning process Jun Hatakeyama, Youichi Ohsawa 2006-09-12
7090961 Photo acid generator, chemical amplification resist material and pattern formation method Satoshi Watanabe, Tsunehiro Nishi, Youichi Ohsawa, Katsuhiro Kobayashi 2006-08-15
6878508 Resist patterning process Satoshi Watanabe 2005-04-12
6830866 Resist composition and patterning process Tsunehiro Nishi, Satoshi Watanabe, Takeshi Kinsho, Shigehiro Nagura, Toshinobu Ishihara 2004-12-14
6794111 Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation Tsunehiro Nishi, Takeshi Kinsho, Seiichiro Tachibana, Takeru Watanabe, Koji Hasegawa 2004-09-21
6749988 Amine compounds, resist compositions and patterning process Jun Hatakeyama, Takeru Watanabe, Takeshi Nagata 2004-06-15