Issued Patents All Time
Showing 26–50 of 112 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9877506 | Flavor inhaler | Takeshi Akiyama, Manabu Yamada | 2018-01-30 |
| 9696545 | Projector having holders arranged in a light emitting direction | — | 2017-07-04 |
| 9551932 | Patterning process and resist composition | Kenji Funatsu, Kentaro Kumaki, Akihiro Seki, Koji Hasegawa | 2017-01-24 |
| 9519213 | Patterning process and resist composition | Kazuhiro Katayama, Kentaro Kumaki, Chuanwen Lin, Masaki Ohashi, Masahiro Fukushima | 2016-12-13 |
| 9488834 | Projector | — | 2016-11-08 |
| 9313933 | Power converter performing evaporative cooling of a switching element | Tetsuo Sugahara, Ryosuke Nakagawa | 2016-04-12 |
| 9299628 | Power semiconductor module | Takayoshi Miki, Yasushi Nakayama, Takeshi Oi, Kazuhiro Tada, Shiori Idaka +2 more | 2016-03-29 |
| 9281760 | Power module and three-level power converter using the same | Yukio Nakashima, Hideo Okayama | 2016-03-08 |
| 9270199 | Power conversion apparatus with a laminated bus bar comprising an exposed heat radiating portion | Kohei Sakamoto, Takeshi Yamamoto, Yasuaki Mamoto, Yukio Nakashima | 2016-02-23 |
| 9221742 | Sulfonium salt, chemically amplified resist composition, and pattern forming process | Masaki Ohashi, Masahiro Fukushima, Ryosuke Taniguchi | 2015-12-29 |
| 9213235 | Patterning process, resist composition, polymer, and monomer | Koji Hasegawa, Masayoshi Sagehashi, Kazuhiro Katayama | 2015-12-15 |
| 9207534 | Nitrogen-containing monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Jun Hatakeyama, Takeru Watanabe | 2015-12-08 |
| 9182668 | Patterning process, resist composition, polymer, and monomer | Koji Hasegawa, Masayoshi Sagehashi, Kazuhiro Katayama | 2015-11-10 |
| 9164384 | Patterning process and resist composition | Masaki Ohashi, Masahiro Fukushima, Kazuhiro Katayama, Chuanwen Lin | 2015-10-20 |
| 9122155 | Sulfonium salt, resist composition and patterning process | Masaki Ohashi, Akihiro Seki, Masayoshi Sagehashi, Masahiro Fukushima | 2015-09-01 |
| 9122152 | Patterning process and resist composition | Jun Hatakeyama, Kenji Funatsu | 2015-09-01 |
| 9104105 | Patterning process and resist composition | Jun Hatakeyama, Koji Hasegawa | 2015-08-11 |
| 9091933 | Negative pattern forming process | Kazuhiro Katayama, Jun Hatakeyama, Kenji Funatsu, Seiichiro Tachibana | 2015-07-28 |
| 9081290 | Patterning process and resist composition | Jun Hatakeyama, Koji Hasegawa, Masayoshi Sagehashi, Kazuhiro Katayama, Kentaro Kumaki | 2015-07-14 |
| 9057949 | Patterning process, resist composition, polymer, and polymerizable ester compound | Takeru Watanabe, Jun Hatakeyama, Kazuhiro Katayama, Takeshi Kinsho | 2015-06-16 |
| 8957160 | Preparation of polymer, resulting polymer, resist composition, and patterning process | Masaki Ohashi, Masayoshi Sagehashi | 2015-02-17 |
| 8956803 | Sulfonium salt, resist composition, and patterning process | Masaki Ohashi, Akihiro Seki, Masayoshi Sagehashi, Masahiro Fukushima | 2015-02-17 |
| 8933251 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | Takeru Watanabe, Satoshi Shinachi, Takeshi Kinsho, Koji Hasegawa, Yuji Harada +2 more | 2015-01-13 |
| 8900793 | Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist composition | Masayoshi Sagehashi, Youichi Ohsawa, Koji Hasegawa | 2014-12-02 |
| 8900796 | Acid generator, chemically amplified resist composition, and patterning process | Masaki Ohashi, Masayoshi Sagehashi | 2014-12-02 |