Issued Patents All Time
Showing 26–50 of 54 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7425390 | Preparation of halftone phase shift mask blank | Hiroki Yoshikawa | 2008-09-16 |
| 7419749 | Halftone phase shift mask blank, halftone phase shift mask and their preparation | Yukio Inazuki, Hiroki Yoshikawa | 2008-09-02 |
| 7351505 | Phase shift mask blank, phase shift mask, and pattern transfer method | Hiroki Yoshikawa, Yukio Inazuki, Takashi Haraguchi, Yuichi Fukushima, Yoshihiro Ii +1 more | 2008-04-01 |
| 7344806 | Method of producing phase shift mask blank, method of producing phase shift mask, phase shift mask blank, and phase shift mask | Hiroki Yoshikawa, Yukio Inazuki, Noriyasu Fukushima, Hideo Kaneko | 2008-03-18 |
| 7329474 | Photomask blank, photomask, and method of manufacture | Hiroki Yoshikawa, Yukio Inazuki, Noriyasu Fukushima, Hideo Kaneko | 2008-02-12 |
| 7179545 | Halftone phase shift mask blank, and method of manufacture | Toshinobu Ishihara | 2007-02-20 |
| 7179567 | Phase shift mask blank, phase shift mask, and method of manufacture | Yukio Inazuki, Masayuki Nakatsu, Tsuneo Numanami, Atsushi Tajika, Hideo Kaneko | 2007-02-20 |
| 7122280 | Angular substrates | Jiro Moriya, Masataka Watanabe | 2006-10-17 |
| 7037625 | Phase shift mask blank and method of manufacture | Hideo Kaneko, Yukio Inazuki, Tetsushi Tsukamoto | 2006-05-02 |
| 6790129 | Method for polishing angular substrates | Jiro Moriya, Masataka Watanabe, Hidekazu Ozawa, You Ishii, Shunichiro Kojima | 2004-09-14 |
| 6733930 | Photomask blank, photomask and method of manufacture | Tsutomu Shinagawa, Tamotsu Maruyama, Hideo Kaneko, Mikio Kojima, Yukio Inazuki | 2004-05-11 |
| 6727027 | Photomask blank and photomask | Tetsushi Tsukamoto, Hideo Kaneko, Tamotsu Maruyama, Yukio Inazuki, Tsutomu Shinagawa | 2004-04-27 |
| 6666957 | Magnetron sputtering system and photomask blank production method based on the same | Masataka Watanabe, Hideo Kaneko, Ken Ohashi, Hideki Kobayashi | 2003-12-23 |
| 6641958 | Phase shift mask blank, phase shift mask, and methods of manufacture | Yukio Inazuki, Tamotsu Maruyama, Mikio Kojima, Hideo Kaneko, Masataka Watanabe | 2003-11-04 |
| 6589699 | Photomask blank and photomask | Hideo Kaneko, Yukio Inazuki | 2003-07-08 |
| 6514642 | Phase shift mask and method of manufacture | Tamotsu Maruyama, Yukio Inazuki, Hideo Kaneko, Shinichi Kohno | 2003-02-04 |
| 6511778 | Phase shift mask blank, phase shift mask and method of manufacture | Ichiro Kaneko, Jiro Moriya, Masayuki Suzuki, Tamotsu Maruyama | 2003-01-28 |
| 6503668 | Phase shift mask blank, phase shift mask, and method of manufacture | Yukio Inazuki, Hideo Kaneko, Tamotsu Maruyama | 2003-01-07 |
| 6503669 | Photomask blank, photomask and method of manufacture | Hideo Kaneko, Yukio Inazuki, Tamotsu Maruyama | 2003-01-07 |
| 6383944 | Micropatterning method | Tomoyoshi Furihata, Hideto Kato | 2002-05-07 |
| 6352801 | Phase shift mask and making process | Hideo Kaneko, Tamotsu Maruyama, Yukio Inazuki | 2002-03-05 |
| 6242151 | Polymers, resist compositions and patterning method | Tomoyoshi Furihata, Hideto Kato | 2001-06-05 |
| 6221989 | Polymers and positive resist compositions | Tomoyoshi Furihata, Hideto Kato | 2001-04-24 |
| 6218069 | Photosensitive resin composition and making process | Hideto Kato, Tomoyoshi Furihata | 2001-04-17 |
| 5773200 | Positive resist composition suitable for lift-off technique and pattern forming method | Kazuhiro Nishikawa, Masaru Kobayashi, Miki Kobayashi, Mitsuo Umemura, Toshinobu Ishihara | 1998-06-30 |